Single-step process for the deposition of high water contact angle and high water sliding angle surfaces by atmospheric pressure dielectric barrier discharge

ACS Applied Materials and Interfaces

Volumn 5, Issue 3, 2013, Pages 1053-1060

  Boscher, Nicolas D ^a   Duday, David ^a   Verdier, Stéphane ^b   Choquet, Patrick ^a  

^a LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY   (Luxembourg)

^b Innovation Centre   (Luxembourg)

Author keywords

atmospheric pressure dielectric barrier discharge; dual scale roughness; plasma polymerized hexamethyldisiloxane thin films; superhydrophobic surfaces; water adhesion

Indexed keywords

ALUMINUM SUBSTRATE; ATMOSPHERIC PRESSURE DIELECTRIC BARRIER DISCHARGES; COLD-ROLLED ALUMINUM; FLUORINE-FREE; HEXAMETHYL DISILOXANE; HIGH WATER; HIGH-ADHESION; MICROMETER SCALE; NANOMETER-SCALE PARTICLES; SINGLE-STEP PROCESS; SLIDING ANGLE; SUPER-HYDROPHOBIC SURFACES; WATER ADHESIONS; WATER DROPLETS;

ADHESION; ALUMINUM FOIL; ATMOSPHERIC PRESSURE; ATOMIC FORCE MICROSCOPY; COLD ROLLING; CONFOCAL MICROSCOPY; CONTACT ANGLE; CRYSTALLOGRAPHY; DIELECTRIC DEVICES; METAL CLADDING; SCANNING ELECTRON MICROSCOPY;

FLOW CONTROL;

EID: 84873628559     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am302795v     Document Type: Article

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