Erratum: Organotin dithiocarbamates: Single-source precursors for tin sulfide thin films by aerosol-assisted chemical vapor deposition (AACVD) (Chemistry of Materials (2013) 25 (266-276) DOI: 10.1021/cm301660n);Organotin dithiocarbamates: Single-source precursors for tin sulfide thin films by aerosol-assisted chemical vapor deposition (AACVD)

Chemistry of Materials

Volumn 25, Issue 3, 2013, Pages 266-276

  Ramasamy, Karthik ^a,c   Kuznetsov, Vladimir L ^b   Gopal, Kandasamy ^a,d   Malik, Mohammad A ^a   Raftery, James ^a   Edwards, Peter P ^b   O'Brien, Paul ^a  

^a UNIVERSITY OF MANCHESTER   (United Kingdom)

^b UNIVERSITY OF OXFORD   (United Kingdom)

^c University of Alabama   (United States)

^d INDIAN INSTITUTE OF TECHNOLOGY BOMBAY   (India)

Author keywords

aerosol assisted chemical vapor deposition; diorganotin dithiocarbamate; single source precursors; thin films; tin sulfide

Indexed keywords

AEROSOLS; CHEMICAL ANALYSIS; CHEMICAL VAPOR DEPOSITION; DECOMPOSITION; ENERGY DISPERSIVE SPECTROSCOPY; IV-VI SEMICONDUCTORS; LAYERED SEMICONDUCTORS; ORGANOMETALLICS; SCANNING ELECTRON MICROSCOPY; SINGLE CRYSTALS; SULFUR COMPOUNDS; SYNTHESIS (CHEMICAL); THERMOGRAVIMETRIC ANALYSIS; THIN FILMS; ULTRAVIOLET VISIBLE SPECTROSCOPY; X RAY DIFFRACTION;

AEROSOL ASSISTED CHEMICAL VAPOR DEPOSITIONS (AACVD); AEROSOL-ASSISTED CHEMICAL VAPOR DEPOSITIONS; DITHIOCARBAMATES; ELECTRICAL RESISTIVITY MEASUREMENTS; ENERGY DISPERSIVE X RAY SPECTROSCOPY; SINGLE CRYSTAL X-RAY STRUCTURES; SINGLE-SOURCE PRECURSOR; TIN SULFIDE;

TIN COMPOUNDS;

EID: 84873628398     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/cm5015465     Document Type: Erratum

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