Diffusion barrier properties of molybdenum back contacts for Cu(In,Ga)Se2 solar cells on stainless steel foils

Journal of Applied Physics

Volumn 113, Issue 5, 2013, Pages

  Blosch P ^a   Pianezzi, F ^a   Chirila A ^a   Rossbach, P ^a   Nishiwaki, S ^a   Buecheler, S ^a   Tiwari, A N ^a  

^a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORBER LAYERS; BACK CONTACT; BARRIER PERFORMANCE; BI-LAYER; CIGS SOLAR CELLS; CU (IN ,GA)SE; DEFECT ANALYSIS; DIFFUSION BARRIER PROPERTY; DIFFUSION PROFILES; FILM DENSITY; IMPURITY DIFFUSION; IRON DISTRIBUTION; IRON IMPURITIES; LINEAR DECREASE; LOW SUBSTRATE TEMPERATURE; MATERIAL DENSITY; PHOTOVOLTAIC DEVICES; SECONDARY ION MASS SPECTROSCOPY; SOLAR CELL EFFICIENCIES; STAINLESS STEEL FOIL;

ANTIREFLECTION COATINGS; CADMIUM COMPOUNDS; CADMIUM SULFIDE; DIFFUSION BARRIERS; EFFICIENCY; GALLIUM; IMPURITIES; IRON; SECONDARY ION MASS SPECTROMETRY; SOLAR CELLS;

NANOSTRUCTURED MATERIALS;

EID: 84873616430     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4789616     Document Type: Article

References (40)

1. P. Jackson, D. Hariskos, E. Lotter, S. Paetel, R. Wuerz, R. Menner, W. Wischmann, and M. Powalla, Prog. Photovoltaics 19, 894 (2011). 10.1002/pip.1078
2. A. Chirilǎ, S. Buecheler, F. Pianezzi, P. Bloesch, C. Gretener, A. R. Uhl, C. Fella, L. Kranz, J. Perrenoud, S. Seyrling, R. Verma, S. Nishiwaki, Y. E. Romanyuk, G. Bilger, and A. N. Tiwari, Nature Mater. 10, 857 (2011). 10.1038/nmat3122
3. F. Pianezzi, A. Chirilǎ, P. Blösch, S. Seyrling, S. Buecheler, L. Kranz, C. Fella, and A. N. Tiwari, Prog. Photovoltaics 20, 253 (2012). 10.1002/pip.1247
4. R. Wuerz, A. Eicke, M. Frankenfeld, F. Kessler, M. Powalla, P. Rogin, and O. Yazdani-Assl, Thin Solid Films 517, 2415 (2009). 10.1016/j.tsf.2008.11.016
5. T. Satoh, Y. Hashimoto, S. Shimakawa, and T. Negami, Solid State Phenom. 93, 127 (2003). 10.4028/www.scientific.net/SSP.93.127
6. K. Herz, A. Eicke, F. Kessler, R. Wächter, and M. Powalla, Thin Solid Films 431-432, 392 (2003). 10.1016/S0040-6090(03)00259-1
7. M. S. Kim, J. H. Yun, K. H. Yoon, and B. T. Ahn, Solid State Phenom. 124-126, 73 (2007). 10.4028/www.scientific.net/SSP.124-126.73
8. S. Niki, AIST Today 43, 19 (2012).
9. H. Park, S. C. Kim, H. C. Bae, T. Cheon, S.-H. Kim, and W. K. Kim, Mol. Cryst. Liq. Cryst. 551 (1), 147-153 (2011). 10.1080/15421406.2011.600634
10. P. Blösch, A. Chirilǎ, F. Pianezzi, S. Seyrling, P. Rossbach, S. Buecheler, S. Nishiwaki, and A. N. Tiwari, IEEE J. Photovoltaics 1, 194 (2011). 10.1109/JPHOTOV.2011.2166589
11. K. Otte, L. Makhova, A. Braun, and I. Konovalov, Thin Solid Films 511-512, 613 (2006). 10.1016/j.tsf.2005.11.068
12. A. P. Sutton and R. W. Balluffi, Interfaces in Crystalline Materials (Oxford University Press, 2007).
13. I. Petrov, P. B. Barna, L. Hultman, and J. E. Greene, J. Vac. Sci. Technol. A 21, 117 (2003). 10.1116/1.1601610
14. G. E. Murch and A. S. Nowick, Diffusion in Crystalline Solids (Academic, 1984), p. 482.
15. D. Gupta, Diffusion Processes in Advanced Technological Materials (William Andrew, 2005), p. 532.
16. P. Heitjans and J. Kärger, Diffusion in Condensed Matter (Springer Verlag, 2005), p. 965.
17. J. C. Fisher, J. Appl. Phys. 22, 74 (1951). 10.1063/1.1699825
18. O. Lundberg, J. Lu, A. Rockett, M. Edoff, and L. Stolt, J. Phys. Chem. Solids 64, 1499 (2003). 10.1016/S0022-3697(03)00127-6
19. R. Schlesiger, C. Oberdorfer, R. Würz, G. Greiwe, P. Stender, M. Artmeier, P. Pelka, F. Spaleck, and G. Schmitz, Rev. Sci. Instrum. 81, 043703 (2010). 10.1063/1.3378674
20. C. Tablero, J. Phys. Chem. A 116, 1390 (2012). 10.1021/jp209594u
21. J. Haider, M. Rahman, B. Corcoran, and M. Hashmi, J. Mater. Process. Technol. 168, 36 (2005). 10.1016/j.jmatprotec.2004.09.093
22. D. Rudmann, G. Bilger, M. Kaelin, F.-J. Haug, H. Zogg, and A. N. Tiwari, Thin Solid Films 431-432, 37 (2003). 10.1016/S0040-6090(03)00246-3
23. D. Rudmann, D. Brémaud, H. Zogg, and A. N. Tiwari, J. Appl. Phys. 97, 1 (2005). 10.1063/1.1857059
24. I. C. Noyan and J. B. Cohen, Residual Stress-Measurement by Diffraction (Springer, New York, 1987), p. 276.
25. J. Lu, Handbook of Measurement of Residual Stresses, 1st ed. (Fairmont, Lilburn, 1996), p. 238.
26. J. A. Thornton, J. Vac. Sci. Technol. 11, 666 (1974). 10.1116/1.1312732
27. R. E. Cuthrell, D. M. Mattox, C. R. Peeples, P. L. Dreike, and K. P. Lamppa, J. Vac. Sci. Technol. A 6, 2914, (1988). 10.1116/1.575451
28. S. A. Pethe, E. Takahashi, A. Kaul, and N. G. Dhere, Sol. Energy Mater. Sol. Cells 100, 1 (2012). 10.1016/j.solmat.2011.11.038
29. J. H. Scofield, A. Duda, D. Albin, B. L. Ballard, and P. K. Predecki, Thin Solid Films 260, 26 (1995). 10.1016/0040-6090(94)06462-8
30. J. Ziegler, SRIM-The Stopping and Range of Ions in Matter, http://www.srim.org (2012).
31. CRC Handbook of Chemistry and Physics, edited by, D. R. Lide, 90th ed. (CRC, 2009), p. 2804.
32. F. Klabunde, M. Lohmann, J. Blasing, and T. Drusedau, J. Appl. Phys. 80, 6266 (1996). 10.1063/1.363702
33. P. Blösch, D. Güttler, A. Chirilǎ, and A. N. Tiwari, Thin Solid Films 519, 7453 (2011). 10.1016/j.tsf.2010.12.187
34. T. Eisenbarth, R. Caballero, C. A. Kaufmann, A. Eicke, and T. Unold, Prog. Photovoltaics 20, 568 (2012). 10.1002/pip.2260
35. S. Zhang, S. Wei, A. Zunger, and H. Katayama-Yoshida, Phys. Rev. B 57, 9642 (1998). 10.1103/PhysRevB.57.9642
36. H. Neumann, E. Nowak, and G. Kuhn, Cryst. Res. Technol. 16, 1369 (1981).
37. G. S. Porras and S. M. Wasim, Phys. Status Solidi A 133, 509 (1992).
38. M. Burgelman, P. Nollet, and S. Degrave, Thin Solid Films 361-362, 527 (2000). 10.1016/S0040-6090(99)00825-1
39. M. Gloeckler, A. L. Fahrenbruch, and J. R. Sites, in Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion (2003), pp. 491-494.
40. U. Rau and H. W. Schock, Appl. Phys. A 69, 131 (1999). 10.1007/s003390050984