Effect of sputtering process parameters on film properties of molybdenum back contact

Solar Energy Materials and Solar Cells

Volumn 100, Issue , 2012, Pages 1-5

  Pethe, Shirish A ^a   Takahashi, Eigo ^a   Kaul, Ashwani ^a   Dhere, Neelkanth G ^a  

^a UNIVERSITY OF CENTRAL FLORIDA   (United States)

Author keywords

CIGS thin film solar cells; DC magnetron sputtering; Mo back contact

Indexed keywords

ADHESIONAL STRENGTH; ADHESIVE TAPES; BACK CONTACT; BEND TEST; CIGS THIN FILMS; DC MAGNETRON SPUTTERING; DEPOSITION TIME; FILM PROPERTIES; FOUR-PROBE MEASUREMENT; GLASS STRIP; HIGH PRESSURE; HIGH-POWER; LOW POWER; LOW PRESSURES; MOLYBDENUM FILMS; MULTI-LAYERED; MULTIPLE TARGETS; PROCESS PARAMETERS; PROFILOMETERS; SODA LIME GLASS SUBSTRATE; SPUTTERING POWER; SPUTTERING PROCESS; TOTAL COSTS; WORKING DISTANCES; WORKING PRESSURES;

ADHESION; EXPERIMENTS; GALLIUM; MOLYBDENUM; SEMICONDUCTING SELENIUM COMPOUNDS; SUBSTRATES; THIN FILMS; VAPOR DEPOSITION;

CONDUCTIVE FILMS;

EID: 84857794903     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2011.11.038     Document Type: Article

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