Photocatalytic activity of thin TiO2 films deposited using sol-gel and plasma enhanced chemical vapor deposition methods

Ceramics International

Volumn 39, Issue 3, 2013, Pages 2787-2794

  Sobczyk Guzenda, Anna ^a   Pietrzyk, Bozena ^a   Szymanowski, Hieronim ^a   Gazicki Lipman, MacIej ^a   Jakubowski, Witold ^a  

^a LODZ UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

A. Sol gel processes; D. Titanium dioxide; Photocatalytic activity; RF PECVD processes

Indexed keywords

AFM; AMORPHOUS TIO; BACTERICIDAL ACTIVITY; CRYSTALLINE STRUCTURE; DEPOSITED MATERIALS; DEPOSITION PROCESS; FILM MORPHOLOGY; HYDROPHILIC EFFECT; HYDROPHILIC PROPERTIES; PHOTO-CATALYTIC; PHOTOCATALYTIC ACTIVITIES; RF-PECVD; SELF-CLEANING PROPERTIES; SOL-GEL TECHNIQUE; SOLGEL FILMS; SURFACE PROFILOMETRY; THIN TITANIUM DIOXIDE FILMS; TIO; TITANIUM DIOXIDE FILMS; UV IRRADIATION;

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; BACTERICIDES; CONTACT ANGLE; DEPOSITS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROPHILICITY; OPTICAL MICROSCOPY; OXIDES; PHOTOCATALYSIS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SOL-GEL PROCESS; SOL-GELS; SURFACE ROUGHNESS; X RAY DIFFRACTION;

TITANIUM DIOXIDE;

EID: 84872977674     PISSN: 02728842     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ceramint.2012.09.046     Document Type: Article

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