First in situ Optical Emission Spectroscopy measurements during cesium low-energy depth profiling

Surface and Interface Analysis

Volumn 45, Issue 1, 2013, Pages 61-64

  Mine, N ^a   Houssiau, L ^a  

^a UNIVERSITY OF NAMUR   (Belgium)

Author keywords

cesium; cesium xenon; depth profiling; optical emission; Optical Emission Spectroscopy; polymer; sputtering; sputtering processes; ToF SIMS

Indexed keywords

ATOMIC LINES; CESIUM-XENON; COSPUTTERING; DEPTH PROFILE; ELECTRON PROMOTION; EX SITU; HARD TASK; INELASTIC COLLISION; INFRARED CHANNEL; LOCAL ENERGY; MOLECULAR DEPTH PROFILING; OPTICAL EMISSIONS; OPTICAL SIGNALS; PRIMARY IONS; SIGNAL INTENSITIES; SILICON SUBSTRATES; SPUTTERING PROCESS; TOF SIMS; WAVELENGTH RANGES;

DEPTH PROFILING; EMISSION SPECTROSCOPY; ENERGY DISSIPATION; EXPERIMENTS; LIGHT EMISSION; OPTICAL EMISSION SPECTROSCOPY; POLYMERS; POLYSTYRENES; SECONDARY ION MASS SPECTROMETRY; SPUTTERING; XENON;

CESIUM;

EID: 84872840141     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.5076     Document Type: Conference Paper

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