Advanced multilayer Laue lens fabrication at NSLS-II

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8502, Issue , 2012, Pages

  Conley, Ray ^a   Bouet, Nathalie ^a   Zhou, Juan ^a   Yan, Hanfei ^a   Chu, Yong ^a   Lauer, Kenneth ^a   Miller, Jesse ^a   Chu, Luke ^b   Jahedi, Nima ^c  

^a BROOKHAVEN NATIONAL LABORATORY   (United States)

^b Northport High School   (United States)

^c ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

Deposition; Laue lens; Multilayer; Optics; Sputter; Thin film; X ray

Indexed keywords

FILM STRESS; GAS-MIXING; GROWTH CONDITIONS; HIGH QUALITY; INTERFACIAL ROUGHNESS; LAUE LENS; LAYER THICKNESS; MULTILAYER GROWTH; MULTILAYER LAUE LENS; NANO-FOCUSING; PROCESS GAS; SCANNING ELECTRON MICROSCOPE; SPUTTER; STATE OF THE ART;

DEPOSITION; FABRICATION; FILM GROWTH; FILM PREPARATION; OPTICS; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAYS;

MULTILAYERS;

EID: 84872573643     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.930216     Document Type: Conference Paper

References (13)

1. "NSLS-II Conceptual Design Report", http://www.bnl.gov/nsls2/ project/CDR/.
2. Conley, R., Liu, C., Qian, J., Kewish, C.M., Macrander, A.T., Yan, H., Kang, H.C., Maser, J., Stephenson, G.B., "Wedged multilayer Laue lens", Rev. Sci. Instrum. 79, 053104 (2008).
3. Maser, J., Stephenson, G.B., Vogt, S., Yun, W., Macrander, A.T., Kang, H.C., Liu, C., and Conley, R., "Multilayer Laue lenses as high-resolution x-ray optics, " in Design and Microfabrication of Novel X-Ray Optics II, edited by A. Snigirev, D. Mancini, Proc. SPIE 5539, 185-194, SPIE, Bellingham, WA, (2004).
4. Liese, T., Radisch, V., Krebs, H.U., "Fabrication of multilayer Laue lenses by a combination of pulsed laser deposition and focused ion beam, " Review of Scientific Instruments, vol.81, no.7, pp.073710-073710-4, (2010).
5. Conley, R., Bouet, N., Biancarosa, J., Shen, Q., Boas, L., Feraca, J., Rosenbaum, L., "The NSLS-II multilayer Laue lens deposition system", Proc. SPIE Vol. 7448 74480U., (2009).
6. MacArthur, K., Shi, B., Conley, R., Macrander, A.T., "Periodic variation of stress in sputter deposited Si/WSi2 multilayers", Appl. Phys. Lett. 99, 081905 (2011).
7. KSA-MOS device, K-Space Associates, Dexter, MA., website www.k-space.com.
8. Ghafoor, N., Eriksson, F., Gullikson, E., Hultman, L., Birch, J., "Incorporation of nitrogen in Cr/Sc multilayers giving improved soft x-ray reflectivity", Applied Physics Letters, Volume 92, Issue 9, 091913 (2008).
9. Windt, D.L., "Reduction of stress and roughness by reactive sputtering in W/B4C multilayer films", Proceedings of SPIE 6688 (2007).
10. Sun-Source magnetrons, Materials Science, Inc., San Diego, CA., website www.msi-pse.com.
11. Miller, J., Chu, L., Lauer, K., Conley, R., "Temperature and Vibration Isolation System Design for the Multilayer Laue Lens Deposition System", manuscript under preparation.
12. Kang, H.C., Maser, J., Stephenson, G.B., Liu, C., Conley, R., Macrander, A.T., Vogt, S., "Nanometer linear focusing of hard x-rays by a multilayer Laue lens, " Phys. Rev. Lett. 96, 127401, (2006).
13. Conley, R., Yan, H., Bouet, N., Zhou, J., Chu, Y. S., Jahedi, N., "Layer Placement Measurement using Marker Layers for Multilayer Laue Lens growth", manuscript under preparation.