Reduction of stress and roughness by reactive sputtering in W/B 4C X-ray multilayer films

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6688, Issue , 2007, Pages

  Windt, David L ^a  

^a Reflective X ray Optics LLC   (United States)

Author keywords

Multilayers; Reactive sputtering; X rays

Indexed keywords

SPUTTER GAS COMPOSITION; X RAY ENERGIES;

FILM GROWTH; MAGNETRON SPUTTERING; REACTIVE SPUTTERING; STRESS ANALYSIS; SURFACE ROUGHNESS; X RAYS;

MULTILAYER FILMS;

EID: 42249107162     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.730647     Document Type: Conference Paper

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