Structural and optoelectronic properties of p-type semiconductor CuAlO 2 thin films

Thin Solid Films

Volumn 526, Issue , 2012, Pages 103-108

  Yu, Ruei Sung ^a   Yin, Hui Hsun ^a  

^a ASIA UNIVERSITY   (Taiwan)

Author keywords

Copper aluminum oxide; Optoelectronic properties; Semiconductor; Sputtering; Structure; Transmission electron microscopy; X ray diffraction

Indexed keywords

ALUMINUM OXIDES; DIRECT BAND GAP; ELECTRICAL RESISTIVITY; GRAIN SIZE; HIGH-TEMPERATURE ANNEALING; HOLDING TIME; MAGNETRON-SPUTTERING DEPOSITION; OPTOELECTRONIC PROPERTIES; OXYGEN ATOM; P TYPE SEMICONDUCTOR; P-TYPE; PHASE CHANGE; QUARTZ SUBSTRATE; ROOT MEAN SQUARE ROUGHNESS;

ALUMINUM; ANNEALING; COPPER; ENERGY GAP; GRAIN GROWTH; GRAIN SIZE AND SHAPE; QUARTZ; SEMICONDUCTOR MATERIALS; SPUTTERING; STRUCTURE (COMPOSITION); TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

INTERFACES (MATERIALS);

EID: 84872162325     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2012.11.033     Document Type: Article

References (28)

1. R.S. Yu, C.J. Lu, D.C. Tasi, S.C. Liang, and F.S. Shieu J. Electrochem. Soc. 154 2007 H838
2. H. Gong, Y. Wang, and Y. Luo Appl. Phys. Lett. 76 2000 3959
3. A.N. Banerjee, C.K. Ghosh, and K.K. Chattopadhyay Sol. Energy Mater. Sol. Cells 89 2005 75
4. Z. Lockman, L.P. Lin, C.K. Yew, and S.D. Hutagalung Sol. Energy Mater. Sol. Cells 93 2009 1383
5. J. Bandara, and J.P. Yasomanee Semicond. Sci. Technol. 22 2007 20
6. N. Koriche, A. Bouguelia, A. Aider, and M. Trari Int. J. Hydrogen Energy 30 2005 693
7. R. Brahimi, Y. Bessekhouad, A. Bouguelia, and M. Trari J. Photochem. Photobiol., A 186 2007 242
8. X.G. Zheng, K. Taniguchi, A. Takahashi, Y. Liu, and C.N. Xu Appl. Phys. Lett. 85 2004 1728
9. H. Ohta, and H. Hosono Mater. Today 7 2004 42
10. H. Kawazoe, M. Yasukawa, H. Hyodo, M. Kurita, H. Yanagi, and H. Hosono Nature 389 1997 939
11. D.S. Kim, T.J. Park, D.H. Kim, and S.Y. Choi Phys. Status Solidi A 203 2006 R51
12. K. Tonooka, H. Bando, and Y. Aiura Thin Solid Films 445 2003 327
13. A.N. Banerjee, S. Nandy, C.K. Ghosh, and K.K. Chattopadhyay Thin Solid Films 515 2007 7324
14. B.D. Cullity, and S.R. Stock Elements of X-ray Diffraction Third ed. 2001 Prentice Hall Upper Saddle River
15. J.H. Shy, and B.H. Tseng J. Phys. Chem. Solids 69 2008 547
16. K. Tonooka, and K. Shimokawa Thin Solid Films 411 2002 129
17. D.R. Gaskell Introduction to Metallurgical Thermodynamics second ed. 1973 McGraw-Hill New York
18. H. Luo, M. Jain, T.M. McCleskey, E. Bauer, A.K. Burrell, and Q. Jia Adv. Mater. 19 2007 3604
19. J.C. Manifacier, J. Gasiot, and J.P. Fillard J. Phys. E 9 1976 1002
20. A.N. Banerjee, and K.K. Chattopadhyay J. Appl. Phys. 97 2005 084308
21. J.I. Pankove Optical Processes in Semiconductors 1971 Prentice-Hall Englewood Cliffs 34
22. S. Agilan, D. Mangalaraj, S.K. Narayandass, and G.M. Rao Physica B 365 2005 93
23. N. Tsuboi, T. Moriya, S. Kobayashi, H. Shimizu, K. Kato, and F. Kaneko Jpn. J. Appl. Phys. 47 2008 592
24. G. Dong, M. Zhang, X. Zhao, Y. Li, and H. Yan J. Cryst. Growth 311 2009 1256
25. C.H. Ong, and H. Gong Thin Solid Films 445 2003 299
26. G. Li, X. Zhu, H. Lei, H. Jiang, W. Song, Z. Yang, J. Dai, Y. Sun, X. Pan, and S. Dai J. Sol-Gel Sci. Technol. 53 2010 641
27. A. Banerjee, K.K. Chattopadhyay, and S.W. Joo Physica B 406 2011 220
28. R.S. Yu, C.J. Huang, R.H. Huang, C.H. Sun, and F.S. Shieu Appl. Surf. Sci. 257 2011 6073