Phase transformation and optoelectronic properties of p-type CuAlO 2 thin films

Journal of the Electrochemical Society

Volumn 154, Issue 9, 2007, Pages

  Yu, Ruei Sung ^a   Lu, Chih Jung ^a   Tasi, Du Cheng ^a   Liang, Shih Chang ^a   Shieu, Fuh Sheng ^a,b  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

^b ELECTROCHEMICAL SOCIETY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

DELAFOSSITE STRUCTURES; OPTOELECTRONIC PROPERTIES;

COPPER COMPOUNDS; CRYSTALLIZATION; ELECTRONIC PROPERTIES; OPTICAL PROPERTIES; PHASE TRANSITIONS; X RAY DIFFRACTION;

THIN FILMS;

EID: 34547504162     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2756991     Document Type: Article

References (29)

1. N. D. Popovich, S. S. Wong, S. Ufer, V. Sakhrani, and D. Paine, J. Electrochem. Soc., 150, H255 (2003).
2. K. Nomura, N. Shibata, and M. Maeda, J. Electrochem. Soc., 149, F76 (2002).
3. H. Matsui, H. Saeki, H. Tabata, and T. Kawai, J. Electrochem. Soc., 150, G508 (2003).
4. C. J. Tun, J. K. Sheu, M. L. Lee, C. C. Hu, C. K. Hsieh, and G. C. Chi, J. Electrochem. Soc., 153, G296 (2003).
5. D. H. Park, Y. H. Cho, Y. R. Do, and B. T. Ahn, J. Electrochem. Soc., 153, H63 (2006).
6. H. G. Hong, J. O. Song, S. H. Kim, T. Lee, and T. Y. Seong, J. Electrochem. Soc., 153, G922 (2006).
7. H. Kawazoe, M. Yasukawa, H. Hyodo, M. Kurita, H. Yanagi, and H. Hosono, Nature (London), 389, 939 (1997).
8. B. J. Ingram, T. O. Mason, R. Asahi, K. T. Park, and A. J. Freeman, Phys. Rev. B, 64, 155114 (2001).
9. K. Ueda, T. Hase, H. Kawazoe, H. Hosono, H. Ohta, M. Orita, and M. Hirano, J. Appl. Phys., 89, 1790 (2001).
10. A. Kudo, H. Yanagi, H. Hosono, and H. Kawazoe, Appl. Phys. Lett., 73, 220 (1998).
11. H. Kawazoe, H. Yanagi, K. Ueda, and H. Hosono, MRS Bull., 25, 28 (2000).
12. H. Gong, Y. Wang, and Y. Luo, Appl. Phys. Lett., 76, 3959 (2000).
13. H. Yanagi, S. I. Inoue, K. Ueda, H. Kawazoe, H. Hosono, and N. Hamada, J. Appl. Phys., 88, 4159 (2000).
14. K. Tonooka, K. Shimokawa, and O. Nishimura, Thin Solid Films, 411, 129 (2002).
15. N. Tsuboi, Y. Takahashi, S. Kobayashi, H. Shimizu, K. Kato, and F. Kaneko, J. Phys. Chem. Solids, 64, 1671 (2003).
16. J. H. Shy and B. H. Tseng, J. Phys. Chem. Solids, 66, 2123 (2005).
17. M. S. Lee, T. Y. Kim, and D. Kim, Appl. Phys. Lett., 79, 2028 (2001).
18. K. Koumoto, H. Koduka, and W. S. Seo, J. Mater. Chem., 11, 251 (2001).
19. J. I. Pankove, Optical Processes in Semiconductors, Prentice-Hall, Inc., Englewood Cliffs, NJ (1971).
20. N. F. Mott and E. A. Davis, Electronic Processes in Non-crystalline Materials, p. 288, Oxford, New York (1979).
21. R. B. Kale and C. D. Lokhande, Semicond. Sci. Technol., 20, 1 (2005).
22. S. Gao, Y. Zhao, P. Gou, N. Chen, and Y. Xie, Nanotechnology, 14, 538 (2003).
23. T. Dittrich, L. Dloczik, T. Guminskaya, M. C. Lux-steiner, N. Grigorieva, and I. Urban, Appl. Phys. Lett., 85, 742 (2004).
24. C. H. Ong and H. Gong, Thin Solid Films, 445, 299 (2003).
25. S. Agilan, D. Mangalaraj, S. K. Narayandass, and G. M. Rao, Physica B, 365, 93 (2005).
26. D. S. Kim and S. Y. Choi, Phys. Status Solidi A, 15, 167 (2005).
27. P. Kofstand, Nonstoichiometry, Diffusion, and Electrical Conductivity in Binary Metal Oxides, p. 19, Wiley-Interscience, New York (1972).
28. A. W. Metz, J. R. Ireland, J. G. Zheng, R. S. M. Lobo, Y. Y. Jun, J. Ni, C. L. Stern, V. P. Dravid, N. Bontemps, C. R. Kannewurf, K. R. Poeppelmeier, and T. J. Marks, J. Am. Chem. Soc., 126, 8477 (2004).
29. H. L. Hartnagel, A. L. Dawar, A. K. Jain, and C. Jagadish, Semiconducting Transparent Thin Films, p. 181, Institute of Physics Publications, Philadelphia, PA (1995).