Optical and electrochemical properties of Cu-doped NiO films prepared by electrochemical deposition

Applied Surface Science

Volumn 257, Issue 9, 2011, Pages 3974-3979

  Zhao, Lili ^a   Su, Ge ^a   Liu, Wei ^a   Cao, Lixin ^a   Wang, Jing ^a   Dong, Zheng ^a   Song, Meiqin ^a  

^a OCEAN UNIVERSITY OF CHINA   (China)

Author keywords

Cathodic deposition; Cu doped NiO films; Electrochromic; Variation of transmittance

Indexed keywords

AMORPHOUS FILMS; BLEACHING; CLEANING; COPPER OXIDES; CYCLIC VOLTAMMETRY; ELECTROCHROMISM; FILM PREPARATION; NANOCOMPOSITES; NANORODS; NICKEL OXIDE; OXIDE FILMS; REDOX REACTIONS; REDUCTION; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DOPING; SUBSTRATES; THIN FILMS; TIN OXIDES; X RAY DIFFRACTION;

CATHODIC DEPOSITION; COATED GLASS SUBSTRATES; ELECTROCHROMIC PROPERTIES; ELECTROCHROMICS; FLUORINE DOPED TIN OXIDE; NIO FILMS; ULTRAVIOLET VISIBLE SPECTROPHOTOMETER; VARIATION OF TRANSMITTANCE;

ELECTROCHEMICAL DEPOSITION;

EID: 78951490632     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.11.160     Document Type: Article

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