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Volumn 85, Issue 10, 2011, Pages 949-954

Thickness dependent properties of nickel oxide thin films deposited by dc reactive magnetron sputtering

Author keywords

Magnetron sputtering; Nickel oxide; Oxide coatings; Thickness

Indexed keywords

BAND GAPS; CRYSTALLINE PROPERTIES; DC REACTIVE MAGNETRON SPUTTERING; ELECTRICAL RESISTIVITY; GLASS SUBSTRATES; NICKEL OXIDE THIN FILMS; NIO FILMS; OPTICAL TRANSMITTANCE; OXIDE COATINGS; PREFERRED ORIENTATIONS; PURE OXYGEN; SPUTTERING POWER; SUBSTRATE TEMPERATURE; THICKNESS; XRD ANALYSIS;

EID: 79953038026     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2011.02.002     Document Type: Article
Times cited : (39)

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