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Journal of Materials Science: Materials in Electronics

Volumn 24, Issue 1, 2013, Pages 166-171

Characterization of aluminum-doped zinc oxide thin films by RF magnetron sputtering at different substrate temperature and sputtering power

(4) Wu, Hung Wei a Yang, Ru Yuan b Hsiung, Chin Min b Chu, Chien Hsun b

a KUN SHAN UNIVERSITY (Taiwan)

b NATIONAL PINGTUNG UNIVERSITY OF SCIENCE AND TECHNOLOGY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AL-DOPED ZINC OXIDE; ALUMINUM-DOPED ZINC OXIDE; AZO THIN FILMS; CORNING GLASS; DIFFERENT SUBSTRATES; ELECTRICAL RESISTIVITY; OPTICAL AND ELECTRICAL PROPERTIES; RADIO FREQUENCY MAGNETRON SPUTTERING; RF-MAGNETRON SPUTTERING; SPUTTERING POWER; SUBSTRATE TEMPERATURE; TRANSPARENT CONDUCTIVE; VISIBLE RANGE; ZNO;

ALUMINUM; ELECTRIC CONDUCTIVITY; MAGNETRON SPUTTERING; SUBSTRATES; ZINC OXIDE;

THIN FILMS;

EID: 84871954671 PISSN: 09574522 EISSN: 1573482X Source Type: Journal
DOI: 10.1007/s10854-012-0769-7 Document Type: Article

Times cited : (29)

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