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Current Applied Physics

Volumn 12, Issue SUPPL.4, 2012, Pages

Resistivity improvement of Al-doped ZnO film by bipolar pulsed dc magnetron sputtering with high Ar flow rate

(2) Yang, Wonkyun a Joo, Junghoon a

a Kunsan National University (South Korea)

Author keywords

Al doped ZnO; Ar flow rate; Bipolar pulsed dc magnetron sputtering

Indexed keywords

AL-DOPED ZNO; ALUMINUM-DOPED ZNO; BIPOLAR PULSE; CRYSTAL PLANES; DC MAGNETRON SPUTTERING; GLASS SUBSTRATES; GRAIN SIZE; HIGH-FLOW RATE; PREFERRED ORIENTATIONS; PULSED DC MAGNETRON SPUTTERING; PUMPING SPEED; PURE ZNO; SPUTTERING POWER; VISIBLE RANGE; WORKING PRESSURES;

ALUMINUM; ALUMINUM COATINGS; MAGNETRON SPUTTERING; SUBSTRATES; ZINC OXIDE;

FLOW RATE;

EID: 84871922105 PISSN: 15671739 EISSN: None Source Type: Journal
DOI: 10.1016/j.cap.2012.05.015 Document Type: Conference Paper

Times cited : (7)

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