Real time x-ray studies during nanostructure formation on silicon via low energy ion beam irradiation using ultrathin iron films

Applied Physics Letters

Volumn 101, Issue 26, 2012, Pages

  El Atwani, Osman ^a   Suslova, Anastassiya ^a   Demasi, Alexander ^b   Gonderman, Sean ^a   Fowler, Justin ^a   El Atwani, Mohamad ^a   Ludwig, Karl ^b   Paul Allain, Jean ^a  

^a PURDUE UNIVERSITY   (United States)

^b Boston University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EX SITU; GRAZING INCIDENCE SMALL-ANGLE X-RAY SCATTERING; IRON ATOMS; IRON FILM; LOW ENERGY ION BEAM; NANODOTS; NANOPATTERNING; NANOSTRUCTURE FORMATION; REAL TIME; SILICIDE FORMATION; SILICON SUBSTRATES; SILICON SURFACES; STRUCTURE FORMATIONS; SURFACE SMOOTHING; SURFACE-ROUGHENING; ULTRA-THIN; X RAY FLUORESCENCE; X-RAY STUDIES;

ION BEAMS; IRON; IRRADIATION; NANOSTRUCTURES; PHOTOELECTRONS; SILICIDES; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

SILICON;

EID: 84871777351     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4773202     Document Type: Article

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