Compliant electrostatic chuck based on hairy microstructure

Smart Materials and Structures

Volumn 22, Issue 1, 2013, Pages

  Saito, Shigeki ^a   Soda, Fumiaki ^a   Dhelika, Radon ^a   Takahashi, Kunio ^a   Takarada, Wataru ^a   Kikutani, Takeshi ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATTRACTIVE FORCE; CONDUCTIVE CORE; ELECTROSTATIC CHUCKS; MECHANICAL COMPLIANCE; ROUGH SURFACES; THIN SEMICONDUCTOR; WEAK POINTS;

MICROSTRUCTURE;

CHUCKS;

EID: 84871559690     PISSN: 09641726     EISSN: 1361665X     Source Type: Journal    
DOI: 10.1088/0964-1726/22/1/015019     Document Type: Article

References (14)

1. Yatsuzuka K, Hatakeyama F, Asano K and Aonuma S 2000 IEEE Trans. IAS 36 510-6
2. Hartsough L 1993 Solid State Technol. 36 1
3. Qin S and McTeer A 2007 J. Appl. Phys. 102 064901 (Pubitemid 47508997)
4. Wright D R, Chen L, Federlin P and Forbes K 1995 J. Vac. Sci. Technol. B 13 1910-6
5. Kanno S and Usui T 2003 J. Vac. Sci. Technol. B 21 2371
6. Watanabe T and Kitabayashi T 1992 J. Ceram. Soc. Japan 100 1
7. Geim A K, Dubonos S V, Grigorieva I V, Novoselov K S and Zhukov A A 2003 Nature Mater. 2 461-3
8. Yurdumakan B, Raravikar N R, Ajayan P M and Dhinojwala A 2005 30 3799-801
9. Parness A, Soto D, Esparza N, Gravish N, Wilkinson M, Autumn K and Cutkosky M 2009 J. R. Soc. Interface 6 41
10. Cappella B and Dietler G 1999 Surf. Sci. Rep. 34 1-104
11. Autumn K and Peattie A 2002 Integr. Comp. Biol. 42 6
12. Gordeyev S A, Ferreira J A, Bernado C A and Ward I M 2001 Mater. Lett. 51 32-6 (Pubitemid 32903810)
13. Takahashi K, Mizuno R and Onzawa T 1995 J. Adhes. Sci. Technol. 9 1451
14. Landman U and Luedtke W 1991 J. Vac. Sci. Technol. B 9 414