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Volumn 16, Issue 6, 2012, Pages 390-394
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Effects of sputtering pressure on properties of Al doped ZnO thin films dynamically deposited by rf magnetron sputtering
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Author keywords
AZO thin films; Dynamic deposition; Photoconductivity; Photovoltaics; Pressure; RF magnetron sputtering
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Indexed keywords
AZO FILMS;
AZO THIN FILMS;
DEPOSITION SYSTEMS;
DYNAMIC MODES;
ELECTRICAL AND OPTICAL PROPERTIES;
FOUR-POINT PROBE MEASUREMENTS;
PHOTOVOLTAICS;
PROPERTIES OF AL;
RF-MAGNETRON SPUTTERING;
SCANNING ELECTRON MICROSCOPE;
SPUTTERING PRESSURES;
UV-VIS SPECTROPHOTOMETERS;
ALUMINUM;
DEPOSITS;
ELECTRIC PROPERTIES;
MAGNETRON SPUTTERING;
OPTICAL PROPERTIES;
PHOTOCONDUCTIVITY;
PRESSURE;
SCANNING ELECTRON MICROSCOPY;
X RAY DIFFRACTION ANALYSIS;
ZINC OXIDE;
OPTICAL FILMS;
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EID: 84871382969
PISSN: 14328917
EISSN: 1433075X
Source Type: Journal
DOI: 10.1179/1433075X12Y.0000000002 Document Type: Article |
Times cited : (11)
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References (18)
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