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Journal of Electroceramics

Volumn 23, Issue 2-4, 2009, Pages 512-518

Effects of sputtering pressure and thickness on properties of ZnO:Al films deposited on polymer substrates

(1) Lee, Jae Hyeong a

a Kunsan National University (South Korea)

Author keywords

Al doped ZnO (ZnO:Al); Polymer substrate; Solar cell; Sputter pressure, thickness; Sputtering

Indexed keywords

AL-DOPED ZNO; ALUMINUM-DOPED ZINC OXIDE; CRYSTALLINITIES; DEGREE OF ORIENTATION; ELECTRICAL PERFORMANCE; GLASS SUBSTRATES; POLYIMIDE SUBSTRATE; POLYMER SUBSTRATE; R.F. MAGNETRON SPUTTERING; ROOM TEMPERATURE; SPUTTER PRESSURE; SPUTTER PRESSURE, THICKNESS; SPUTTERING PRESSURES; VISIBLE SPECTRA; WAVELENGTH RANGES; ZNO; ZNO:AL FILMS;

ALUMINUM; CARRIER CONCENTRATION; CARRIER MOBILITY; CONDUCTIVE FILMS; ELECTRIC PROPERTIES; GLASS; METALLIC FILMS; OPTICAL PROPERTIES; OXIDE FILMS; POLYIMIDES; POLYMER FILMS; SOLAR CELLS; ZINC; ZINC OXIDE;

SUBSTRATES;

EID: 73449094909 PISSN: 13853449 EISSN: 15738663 Source Type: Journal
DOI: 10.1007/s10832-008-9523-1 Document Type: Article

Times cited : (50)

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