Morphological, structural, and photoelectrochemical characterization of n-type Cu2O thin films obtained by electrodeposition

Physica Status Solidi (A) Applications and Materials Science

Volumn 209, Issue 12, 2012, Pages 2470-2475

  Grez, Paula ^a   Herrera, Francisco ^b   Riveros, Gonzalo ^c   Ramírez, Andrés ^a   Henríquez, Rodrigo ^a   Dalchiele, Enrique ^d   Schrebler, Ricardo ^a  

^a PONTIFICIA UNIVERSIDAD CATÓLICA DE VALPARAÍSO   (Chile)

^b UNIVERSIDAD DE SANTIAGO DE CHILE   (Chile)

^c UNIVERSIDAD DE VALPARAÍSO   (Chile)

^d INSTITUTO DE FÍSICA   (Uruguay)

Author keywords

Cu2O; electrodeposition; photoelectrochemical properties; thin films

Indexed keywords

FLUORINE DOPED TIN OXIDE; GLASS SUBSTRATES; HIGH CRYSTALLINITY; MOTT-SCHOTTKY; N-TYPE SEMICONDUCTORS; NON-STOICHIOMETRIC COMPOUNDS; NON-STOICHIOMETRY; OXIDATION REACTIONS; PHOTOANODE; PHOTOELECTROCHEMICAL CHARACTERIZATION; PHOTOELECTROCHEMICAL PROPERTIES; PHOTOELECTROCHEMICALS; POTENTIAL VALUES; PREFERENTIAL GROWTH; XPS ANALYSIS;

ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; ELECTROCHEMISTRY; ELECTRODEPOSITION; NANOCOMPOSITES; PHOTOELECTRONS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; TIN; TIN OXIDES; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

THIN FILMS;

EID: 84871219547     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.201228286     Document Type: Article

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