Preparation and photoelectrochemical characterization of porphyrin-sensitized α -Fe2 O3 thin films

Journal of the Electrochemical Society

Volumn 157, Issue 5, 2010, Pages

  Herrera, Francisco V ^a   Grez, Paula ^a   Schrebler, Ricardo ^a   Ballesteros, Luis A ^a   Muoz, Eduardo ^a   Córdova, Ricardo ^a   Altamirano, Hernán ^a   Dalchiele, Enrique A ^b  

^a PONTIFICIA UNIVERSIDAD CATÓLICA DE VALPARAÍSO   (Chile)

^b INSTITUTO DE FÍSICA   (Uruguay)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE; ELECTROCHEMICAL IMPEDANCE MEASUREMENTS; KI SOLUTION; MORPHOLOGICAL CHARACTERISTIC; MOTT-SCHOTTKY ANALYSIS; PHOTOCURRENT RESPONSE; PHOTOELECTROCHEMICAL CHARACTERIZATION; PHOTOELECTROCHEMICAL RESPONSE; PRECURSOR LAYER; SURFACE STATE; TETRAKIS; TIME TRANSIENT; WHITE-LIGHT ILLUMINATION;

ADSORPTION; ATOMIC FORCE MICROSCOPY; CARRIER CONCENTRATION; CORROSION; ELECTRODEPOSITION; HEMATITE; IRON ORES; LIGHT; OXIDE MINERALS; PORPHYRINS; POTASSIUM IODIDE; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY DIFFRACTION;

SEMICONDUCTING FILMS;

EID: 77951165268     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3357257     Document Type: Article

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