Characterization of Cl-doped n-type Cu2O prepared by electrodeposition

Thin Solid Films

Volumn 518, Issue 19, 2010, Pages 5363-5367

  Han, Xiaofei ^a   Han, Kunhee ^a   Tao, Meng ^a  

^a The University of Texas at Arlington   (United States)

Author keywords

Chlorine; Copper oxide; Doping; Electrodeposition; N type

Indexed keywords

CL-CONCENTRATIONS; CL-DOPED; COMPLEXING AGENTS; CUPROUS OXIDE; DEPOSITION TEMPERATURES; DOPING; DOPING LEVELS; ELECTRICAL PROPERTY; N-TYPE; N-TYPE CONDUCTIVITY; N-TYPE DOPING; POTENTIAL MEASUREMENTS; SMALL GRAIN SIZE; SOLAR-CELL APPLICATIONS; SOLUTION PH;

CHLORINE; ELECTRIC PROPERTIES; ELECTRODEPOSITION; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION;

DOPING (ADDITIVES);

EID: 77955662944     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.03.085     Document Type: Article

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