Microstructural evolution of thin film vanadium oxide prepared by pulsed-direct current magnetron sputtering

Journal of Applied Physics

Volumn 112, Issue 9, 2012, Pages

  Motyka, M A ^a   Gauntt, B D ^b   Horn, M W ^a   Dickey, E C ^c   Podraza, N J ^d  

^a The Pennsylvania State University   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

^c North Carolina State University   (United States)

^d UNIVERSITY OF TOLEDO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC CONDITIONS; ATMOSPHERIC EXPOSURES; COMPLEX DIELECTRIC FUNCTIONS; DEPOSITED FILMS; DEPOSITION TIME; ENVIRONMENTAL STABILITY; EX SITU; IN-SITU MEASUREMENT; MICROSTRUCTURAL VARIATION; PROCESS PARAMETERS; PULSED DC; REAL TIME; SPECTRAL RANGE; STRUCTURAL VARIATIONS; TOP SURFACE; TOTAL PRESSURE; VANADIUM OXIDES; VANADIUM TARGET;

DEPOSITS; ELECTRIC PROPERTIES; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; OXIDES; OXYGEN; SPECTROSCOPIC ELLIPSOMETRY; THIN FILMS; VANADIUM COMPOUNDS; VAPOR DEPOSITION;

FILM GROWTH;

EID: 84870863702     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4759255     Document Type: Article

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