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Volumn 1, Issue 3, 2012, Pages

Random process of filamentary growth and localized switching mechanism in resistive switching of SiOx thin films

Author keywords

[No Author keywords available]

Indexed keywords


EID: 84870450543     PISSN: 21628769     EISSN: 21628777     Source Type: Journal    
DOI: 10.1149/2.013203jss     Document Type: Article
Times cited : (15)

References (18)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.