Fabrication of porous ZnO via electrochemical etching using 10 wt potassium hydroxide solution

Materials Science in Semiconductor Processing

Volumn 16, Issue 1, 2013, Pages 70-76

  Ching, C G ^a   Ooi, P K ^a   Ng, S S ^a   Ahmad, M A ^a   Hassan, Z ^a   Abu Hassan, H ^a   Abdullah, M J ^a  

^a SCHOOL OF PHYSICS   (Malaysia)

Author keywords

Electrochemical; Etching; Photoluminescence; Scanning electron microscopy; X ray diffraction; ZnO

Indexed keywords

CONSTANT VOLTAGE; CROSS-SECTIONAL SEM IMAGE; CRYSTALLINITIES; ELECTROCHEMICAL; ETCHING PROCESS; ETCHING TIME; KOH SOLUTION; LAYER THICKNESS; PL EXCITATIONS; PL SPECTRA; POTASSIUM HYDROXIDE SOLUTION; RADIO FREQUENCY SPUTTERING; RED SHIFT; STRUCTURAL AND OPTICAL PROPERTIES; SURFACE-TO-VOLUME RATIO; VERTICAL ETCHING; XRD SPECTRA; ZNO; ZNO SURFACE; ZNO THIN FILM;

ETCHING; FABRICATION; GRAIN BOUNDARIES; OPTICAL PROPERTIES; PHOTOLUMINESCENCE; PHOTOLUMINESCENCE SPECTROSCOPY; POTASSIUM HYDROXIDE; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION; ZINC OXIDE;

ELECTROCHEMICAL ETCHING;

EID: 84870428160     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mssp.2012.06.017     Document Type: Article

References (26)

1. K. Shin, K. Prabakar, W.P. Tai, J.H. Oh, C. Lee, D.W. Park, and W.S. Ahn J. Korean Phy. Soc 45 2004 1288 1291
2. Y. Ma, G. Du, J. Yin, T. Yang, and Y. Zhang Semicond. Sci. and Tech. 20 2005 1198 1202
3. S. Gupta, A. Joshi, and M. Kaur J. Chem. Sci. 122 2010 57 62
4. A. Tsukazaki, M. Kubota, A. Ohtomo, T. Onuma, K. Ohtani, H. Ohno, S.F. Chichibu, and M. Kawasaki Jpn. J. Appl. Phys. 44 2005 L643 L645
5. Y. Ryu, T. Lee, J. Lubguban, H. White, Y. Park, and C. Youn Appl. Phys. Lett. 87 2005 153504
6. M. Kumar, J.P. Kar, I.-S. Kim, S.-Y. Choi, and J.-M. Myoung Curr. Appl.Phys. 11 2011 65 69
7. W.Zhong Lin Mater. Today 7 2004 26 33
8. B.U. Ye, H. Yu, M.H. Kim, J.L. Lee, and J.M. Baik J. Phys. Chem. C 115 2011 7987 7992
9. P. Basu, N. Saha, S. Maji, H. Saha, S. Basu, and J. Mater. Sci. Mater. Electron 19 2008 493 499
10. J. Wang, X. Sun, H. Huang, Y. Lee, O. Tan, M. Yu, G. Lo, and D. Kwong Appl. Phys. A-Mater 88 2007 611 615
11. A.J. Cheng, Y. Tzeng, Y. Zhou, M. Park, T. Wu, C. Shannon, D. Wang, and W. Lee Appl. Phys. Lett. 92 2008 092113
12. M.A. McLachlan, H. Rahman, B. Illy, D.W. McComb, and M.P. Ryan Mater. Chem. Phys. 129 2011 343 348
13. D.G. Yoo, S.H. Nam, M.H. Kim, S.H. Jeong, H.G. Jee, H.J. Lee, N.E. Lee, B.Y. Hong, Y.J. Kim, D. Jung, and J.H. Boo Surf. Coat. Tech. 202 2008 5476 5479
14. S.E. Pust, J.P. Becker, J. Worbs, S.O. Klemm, K.J.J. Mayrhofer, and J. Hüpkes J. Electrochem. Soc. 158 2011 D413 D419
15. J.N. Bugayong, Electrochemical Etching of Isolated Structures in p-Type Silicon, Louisiana State University, Agricultural and Mechanical College, M.Sc Thesis, 2010.
16. W. Jo, S.J. Kim, and D.Y. Kim Acta Mater. 53 2005 4185 4188
17. J. Ding, F. Ye, N. Yuan, C. Tan, Y. Zhu, G. Ding, and Z. Chen Appl. Surf. Sci. 257 2010 1420 1424
18. J. Sun, J. Bian, H. Liang, J. Zhao, L. Hu, Z. Zhao, W. Liu, and G. Du Appl. Surf. Sci. 253 2007 5161 5165
19. J.E. Spanier, and I.P. Herman Phys. Rev. B 61 2000 10437 10450
20. B.M. Cheng, L. Yu, C. Duan, H. Wang, and P.A. Tanner J. Phys.- Condens. Mat 20 2008 345231
21. M. Chen, F. Gu, Z. Wang, D. Han, and G. Guo J. Phys. Chem. C 2011 12763 12773
22. P. Gao, Y. Chen, Y. Wang, Q. Zhang, X. Li, and M. Hu Chem. Commun. 2009 2762 2764
23. C.W. Zou, X.D. Yan, J. Han, R.Q. Chen, J.M. Bian, E. Haemmerle, and W. Gao Chem. Phys. Lett. 476 2009 84 88
24. T.-L. Phan, S.C. Yu, R. Vincent, N.H. Dan, and W.S. Shi J. Lumin. 130 2010 1142 1146
25. F.K. Yam, Z. Hassan, and S.S. Ng Thin Solid Films 515 2007 3469 3474
26. J. Sun, J. Bian, H. Liang, J. Zhao, L. Hu, Z. Zhao, W. Liu, and G. Du Appl. Surf. Sci. 253 2007 5161 5165