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Volumn 202, Issue 22-23, 2008, Pages 5476-5479
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Fabrication of the ZnO thin films using wet-chemical etching processes on application for organic light emitting diode (OLED) devices
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Author keywords
81.65.Cf; Chemical etching; Indium tin oxide; Organic light emitting diode; RF sputtering; Transparent conductive oxide; ZnO thin film
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Indexed keywords
ETCHING;
HELMET MOUNTED DISPLAYS;
INDICATORS (CHEMICAL);
LIGHT EMITTING DIODES;
MAGNETRON SPUTTERING;
METALLIC FILMS;
OPTICAL DESIGN;
OPTICAL FILMS;
ORGANIC LIGHT EMITTING DIODES (OLED);
OXIDE FILMS;
SEMICONDUCTING ZINC COMPOUNDS;
THICK FILMS;
THIN FILMS;
ZINC ALLOYS;
ZINC OXIDE;
81.65.CF;
CHEMICAL ETCHING;
INDIUM TIN OXIDE;
OLED DEVICES;
ORGANIC LIGHT EMITTING DIODE;
RF MAGNETRON SPUTTERING METHOD;
RF SPUTTERING;
ROOM TEMPERATURES;
TRANSPARENT CONDUCTIVE OXIDE;
WET-CHEMICAL ETCHING;
ZNO FILMS;
ZNO THIN FILM;
ZNO THIN FILMS;
CONDUCTIVE FILMS;
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EID: 50449087887
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2008.06.064 Document Type: Article |
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Times cited : (49)
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References (10)
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