Nanoparticle movement: Plasmonic forces and physical constraints

Ultramicroscopy

Volumn 123, Issue , 2012, Pages 50-58

  Batson, P E ^a   Reyes Coronado, A ^b   Barrera, R G ^c   Rivacoba, A ^b,d   Echenique, P M ^b,d   Aizpurua, J ^b,d  

^a RUTGERS UNIVERSITY   (United States)

^b DONOSTIA INTERNATIONAL PHYSICS CENTER DIPC   (Spain)

^c UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

^d UNIVERSITY OF THE BASQUE COUNTRY UPV EHU   (Spain)

Author keywords

Aberration corrected microscopy; Debye forces; Keesom forces; Nanoparticle structure; Plasmonic forces; STEM; Van der Waals forces

Indexed keywords

ABERRATION-CORRECTED; DEBYE FORCES; KEESOM FORCES; NANOPARTICLE STRUCTURES; PLASMONIC; STEM;

ELECTRIC FIELDS; ELECTRON BEAMS; PLASMONS; VAN DER WAALS FORCES;

NANOPARTICLES;

NANOPARTICLE;

ANALYTICAL PARAMETERS; ARTICLE; ELECTRIC FIELD; ELECTRIC POTENTIAL; ELECTROMAGNETIC FIELD; ELECTRON BEAM; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON MICROSCOPY; MOLECULAR IMAGING; SCANNING TRANSMISSION ELECTRON MICROSCOPY; CHEMISTRY; ELECTRICITY; ELECTRON; METHODOLOGY; SURFACE PLASMON RESONANCE; DIELECTRIC CONSTANT; FOURIER TRANSFORMATION; IONIZATION; NANOANALYSIS; PARTICLE SIZE; POLARIZATION;

ELECTRICITY; ELECTRONS; MICROSCOPY, ELECTRON; NANOPARTICLES; SURFACE PLASMON RESONANCE;

EID: 84870426502     PISSN: 03043991     EISSN: 18792723     Source Type: Journal    
DOI: 10.1016/j.ultramic.2012.05.004     Document Type: Article

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