Dual function of antireflectance and surface passivation of atomic-layer-deposited Al2O3 films

IEEE Electron Device Letters

Volumn 33, Issue 12, 2012, Pages 1753-1755

  Zhu, Li Qiang ^a   Li, Xiang ^a   Yan, Zhong Hui ^a   Zhang, Hong Liang ^a   Wan, Qing ^a  

^a NINGBO INSTITUTE OF MATERIALS TECHNOLOGY AND ENGINEERING   (China)

Author keywords

Antireflectance; atomic layer deposition (ALD) deposited Al2O3 film; Si solar cells; surface passivation

Indexed keywords

ANTI-REFLECTANCE; ATOMIC LAYER DEPOSITED; CZOCHRALSKI SI; DUAL FUNCTION; FILM DEPOSITION; MINORITY CARRIER LIFETIMES; PASSIVATION PROPERTIES; SI SOLAR CELLS; SI WAFER; SOLAR-CELL APPLICATIONS; SURFACE PASSIVATION; TEXTURED SI;

ALUMINUM; DEPOSITS; PASSIVATION; SILICON; SILICON SOLAR CELLS; SILICON WAFERS;

ATOMIC LAYER DEPOSITION;

EID: 84870413339     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2012.2219491     Document Type: Article

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