Optical limiting properties in copper oxide thin films under a high-repetition-rate femtosecond laser

Materials Letters

Volumn 91, Issue , 2013, Pages 319-322

  Chen, Aiping ^a   Yang, Guang ^b   Long, Hua ^b   Lu, Peixiang ^b   Zhang, Wenrui ^a   Wang, Haiyan ^a  

^a Department of Electrical and Computer Engineering   (United States)

^b HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

CuO thin films; Optical materials and properties; Z scan

Indexed keywords

COPPER OXIDE THIN FILMS; DAMAGE THRESHOLD; HIGH REPETITION RATE; NANOCRYSTALLINE FILMS; NANOCRYSTALLINE THIN FILMS; OPTICAL LIMITERS; OPTICAL LIMITING; OPTICAL LIMITING PROPERTIES; OPTICAL MATERIALS AND PROPERTIES; OPTICAL NONLINEARITY; QUARTZ SUBSTRATE; X-RAY PHOTOELECTRON SPECTROMETERS; Z-SCAN; Z-SCAN METHOD;

LASERS; NONLINEAR OPTICS; PULSED LASER DEPOSITION; QUARTZ; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; ULTRASHORT PULSES; X RAY DIFFRACTION;

OPTICAL PROPERTIES;

EID: 84870225447     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2012.09.111     Document Type: Article

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