Third-order optical nonlinearities in anatase and rutile TiO2 thin films

Thin Solid Films

Volumn 517, Issue 19, 2009, Pages 5601-5604

  Long, Hua ^a   Chen, Aiping ^a   Yang, Guang ^a   Li, Yuhua ^a   Lu, Peixiang ^a  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Optical nonlinearities; Pulsed laser deposition; TiO2 thin films

Indexed keywords

ALL-OPTICAL SWITCHING DEVICES; ANATASE FILMS; ANATASE PHASE; DOUBLE-BEAM; FEMTO-SECOND LASER; FIGURE OF MERIT; FUSED QUARTZ; IMAGINARY PARTS; OPTICAL NONLINEARITIES; OPTICAL NONLINEARITY; OPTICAL TRANSMISSION SPECTRUM; OPTIMAL CONDITIONS; POTENTIAL APPLICATIONS; PULSED-LASER DEPOSITION TECHNIQUE; RUTILE FILMS; RUTILE PHASE; RUTILE TIO; SI (001) SUBSTRATE; SURFACE IMAGE; THIRD ORDER NONLINEAR OPTICAL SUSCEPTIBILITY; THIRD-ORDER OPTICAL NONLINEARITIES; TIO; TIO2 THIN FILMS; Z-SCAN MEASUREMENT; Z-SCAN METHOD;

LASERS; NONLINEAR OPTICS; OPTICAL MICROSCOPY; OPTICAL SWITCHES; OXIDE MINERALS; PULSED LASER DEPOSITION; QUARTZ; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES;

OPTICAL FILMS;

EID: 66149090726     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.01.133     Document Type: Article

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