Investigation of surface etching of poly(ether ether ketone) by atmospheric-pressure plasmas

IEEE Transactions on Plasma Science

Volumn 40, Issue 11 PART1, 2012, Pages 2900-2911

  Fricke, Katja ^a   Reuter, Stephan ^a   Schroder, Daniel ^b   Schulz Von Der Gathen, Volker ^b   Weltmann, Klaus Dieter ^a   Von Woedtke, Thomas ^a  

^a LEIBNIZ INSTITUTE FOR PLASMA SCIENCE AND TECHNOLOGY   (Germany)

^b RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

Atmospheric pressure plasma jet; modification; plasma etching; surface topology

Indexed keywords

ARGON PLASMAS; ATMOSPHERIC PRESSURE PLASMAS; ETCHING MECHANISM; ETCHING PROCESS; LASER INDUCED FLUORESCENCE SPECTROSCOPY; MODIFICATION; OXYGEN SPECIES; PLASMA TREATMENT; REACTIVE PLASMA SPECIES; SURFACE ETCHING; SURFACE PROFILES; SURFACE PROFILOMETRY; SURFACE TOPOLOGY; TWO-PHOTON ABSORPTIONS;

ARGON; ATOMIC FORCE MICROSCOPY; FLUORESCENCE MICROSCOPY; FLUORESCENCE SPECTROSCOPY; PHOTOELECTRONS; PLASMA APPLICATIONS; PLASMA DIAGNOSTICS; PLASMA ETCHING; PLASMA JETS; PLASMAS; SURFACE ANALYSIS; SURFACE ROUGHNESS; TWO PHOTON PROCESSES; X RAY PHOTOELECTRON SPECTROSCOPY;

MOLECULAR OXYGEN;

EID: 84870062967     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2012.2212463     Document Type: Article

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