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Plasma Processes and Polymers

Volumn 8, Issue 1, 2011, Pages 51-58

High rate etching of polymers by means of an atmospheric pressure plasma jet

(5) Fricke, Katja a Steffen, Hartmut a Von Woedtke, Thomas a Schröder, Karsten a Weltmann, Klaus Dieter a

a LEIBNIZ INSTITUTE FOR PLASMA SCIENCE AND TECHNOLOGY (Germany)

Author keywords

atmospheric pressure; plasma etching; plasma jet; polymers; removal of micro organisms

Indexed keywords

ARGON PLASMAS; ATMOSPHERIC PLASMA JETS; ATMOSPHERIC PRESSURE PLASMA JETS; ATMOSPHERIC PRESSURE PLASMAS; BACTERIAL CELLS; ETCH PROFILE; ETCH RATES; HIGH ETCH RATE; HIGH-RATE ETCHING; MASS LOSS; MODEL COMPOUND; NONTHERMAL; ORGANIC MATERIALS; PLASMA EXPOSURE; POLYMER REMOVAL; POLYMERIC MATERIAL; POTENTIAL APPLICATIONS; REACTIVE OXYGEN SPECIES; SUBSTRATE DISTANCE;

ARGON; ATMOSPHERIC PRESSURE; ATMOSPHERICS; BIOFILMS; BIOLOGY; ETHERS; KETONES; MICROORGANISMS; OXYGEN; PLASMA ACCELERATORS; PLASMA ETCHING; PLASMA JETS; PLASMA SOURCES;

POLYMERS;

EID: 78751603917 PISSN: 16128850 EISSN: 16128869 Source Type: Journal
DOI: 10.1002/ppap.201000093 Document Type: Article

Times cited : (146)

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