Transparent conductive indium zinc oxide films prepared by pulsed plasma deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 30, Issue 6, 2012, Pages

  Wan, Runlai ^a   Yang, Ming ^a   Zhou, Qianfei ^a   Zhang, Qun ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

A-CERAMICS; AMORPHOUS STRUCTURES; ATOMIC FORCE MICROSCOPE (AFM); ATOMIC RATIO; CHARACTERIZATION METHODS; CHEMICAL STATE; CRYSTALLINITIES; FILM PROPERTIES; HALL MEASUREMENTS; INDIUM-ZINC-OXIDE FILMS; POLYCRYSTALLINE STRUCTURE; PREFERRED GROWTH; PULSED PLASMA DEPOSITION; RESISTIVITY VALUES; ROOM TEMPERATURE; ROOT MEAN SQUARE ROUGHNESS; SMOOTH SURFACE; SUBSTRATE TEMPERATURE; TRANSPARENT CONDUCTIVE; VISIBLE REGION; ZINC ATOMS; ZNO;

AMORPHOUS FILMS; AMORPHOUS MATERIALS; ATOMIC FORCE MICROSCOPY; ELECTRIC PROPERTIES; OXIDE FILMS; PHOTOELECTRONS; PLASMA DEPOSITION; ULTRAVIOLET VISIBLE SPECTROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC; ZINC OXIDE;

FILM PREPARATION;

EID: 84870013816     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.4762800     Document Type: Article

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