Analysis of blister formation in spatial ALD Al2O3 for silicon surface passivation

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 2012, Pages 1049-1054

  Hennen, L ^a,b   Granneman, E H A ^a   Kessels, W M M ^b  

^a Levitech BV   (Netherlands)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

amorphous materials; charge carrier lifetime; dielectric films; hydrogen; photovoltaic cells; silicon

Indexed keywords

AFM; ALUMINUM OXIDES; BLISTER FORMATION; HYDROGEN DIFFUSION; MINORITY CARRIER; SILICON SURFACES; SURFACE PASSIVATION;

AMORPHOUS MATERIALS; CHARGE CARRIERS; DIELECTRIC FILMS; HYDROGEN; PHOTOVOLTAIC CELLS; SILICON;

ALUMINUM;

EID: 84869470330     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2012.6317783     Document Type: Conference Paper

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