Contact resistance of low-temperature carbon nanotube vertical interconnects

Proceedings of the IEEE Conference on Nanotechnology

Volumn , Issue , 2012, Pages

  Vollebregt, Sten ^a   Chiaramonti, Ann N ^b   Ishihara, Ryoichi ^a   Schellevis, Hugo ^a   Beenakker, Kees ^a  

^a Department of Microelectronics   (Netherlands)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CNT TIP; CROSS-SECTIONAL IMAGING; ELECTRICAL CONTACT RESISTANCE; ELECTRICAL MEASUREMENT; LOW TEMPERATURES; MEAN FREE PATH; MULTIPLE WALLS; TIP GROWTH; TUBE DENSITY; VERTICALLY ALIGNED CARBON NANOTUBE;

CONTACT RESISTANCE; NANOTECHNOLOGY; RAMAN SPECTROSCOPY;

CARBON NANOTUBES;

EID: 84869162795     PISSN: 19449399     EISSN: 19449380     Source Type: Conference Proceeding    
DOI: 10.1109/NANO.2012.6321985     Document Type: Conference Paper

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