-
1
-
-
0004218389
-
-
(University of Science and Technology of China Press, Hefei
-
H. Q. Zhao: Plasma Chemistry and Processing (University of Science and Technology of China Press, Hefei, 1993) p. 71.
-
(1993)
Plasma Chemistry and Processing
, pp. 71
-
-
Zhao, H.Q.1
-
4
-
-
77956699042
-
-
J. Heinlin, G. Isbary, W. Stolz, G. Morfill, M. Landthaler, T. Shimizu, B. Steffes, T. Nosenko, J. L. Zimmermann, and S. Karrer: J. Eur. Acad. Dermatol. 25 (2011) 1.
-
(2011)
J. Eur. Acad. Dermatol.
, vol.1
, pp. 25
-
-
Heinlin, J.1
Isbary, G.2
Stolz, W.3
Morfill, G.4
Landthaler, M.5
Shimizu, T.6
Steffes, B.7
Nosenko, T.8
Zimmermann, J.L.9
Karrer, S.10
-
5
-
-
78650086254
-
-
A. Vogelsang, A. Ohl, R. Foest, K. Schroder, and K. D. Weltmann: J. Phys. D 43 (2010) 485201.
-
(2010)
J. Phys.
, vol.D 43
, pp. 485201
-
-
Vogelsang, A.1
Ohl, A.2
Foest, R.3
Schroder, K.4
Weltmann, K.D.5
-
6
-
-
77956612917
-
-
F. Thevenet, J. Couble, M. Brandhorst, J. L. Dubois, E. Puzenat, C. Guillard, and D. Bianchi: Plasma Chem. Plasma Phys. 30 (2010) 489.
-
(2010)
Plasma Chem. Plasma Phys.
, vol.30
, pp. 489
-
-
Thevenet, F.1
Couble, J.2
Brandhorst, M.3
Dubois, J.L.4
Puzenat, E.5
Guillard, C.6
Bianchi, D.7
-
7
-
-
77951578751
-
-
Q. Xiong, X. Lu, Y. Xian, J. Liu, C. Zou, Z. Xiong, W. Gong, K. Chen, X. Pei, F. Zou, J. Hu, Z. Jiang, and Y. Pan: J. Appl. Phys. 107 (2010) 073302.
-
(2010)
J. Appl. Phys.
, vol.107
, pp. 073302
-
-
Xiong, Q.1
Lu, X.2
Xian, Y.3
Liu, J.4
Zou, C.5
Xiong, Z.6
Gong, W.7
Chen, K.8
Pei, X.9
Zou, F.10
Hu, J.11
Jiang, Z.12
Pan, Y.13
-
9
-
-
77950239557
-
-
H. W. Lee, S. H. Nam, A. A. H. Mohamed, G. C. Kim, and J. K. Lee: Plasma Processes Polym. 7 (2010) 274.
-
(2010)
Plasma Processes Polym.
, vol.7
, pp. 274
-
-
Lee, H.W.1
Nam, S.H.2
Mohamed, A.A.H.3
Kim, G.C.4
Lee, J.K.5
-
10
-
-
70350492330
-
-
X. P. Lu, Q. Xiong, Z. L. Xiong, J. Hu, F. Zhou, W. W. Gong, Y. B. Xian, C. L. Zhou, Z. Y. Tang, Z. H. Jiang, and Y. Pan: Thin Solid Films 518 (2009) 967.
-
(2009)
Thin Solid Films
, vol.518
, pp. 967
-
-
Lu, X.P.1
Xiong, Q.2
Xiong, Z.L.3
Hu, J.4
Zhou, F.5
Gong, W.W.6
Xian, Y.B.7
Zhou, C.L.8
Tang, Z.Y.9
Jiang, Z.H.10
Pan, Y.11
-
12
-
-
42349085395
-
-
X. P. Lu, Z. H. Jiang, Q. Xiong, Z. Y. Tang, and Y. Pan: Appl. Phys. Lett. 92 (2008) 151504.
-
(2008)
Appl. Phys. Lett.
, vol.92
, pp. 151504
-
-
Lu, X.P.1
Jiang, Z.H.2
Xiong, Q.3
Tang, Z.Y.4
Pan, Y.5
-
19
-
-
76749100220
-
-
J. L. Walsh, F. Iza, N. B. Janson, V. J. Law, and M. G. Kong: J. Phys. D 43 (2010) 075201.
-
(2010)
J. Phys.
, vol.D 43
, pp. 075201
-
-
Walsh, J.L.1
Iza, F.2
Janson, N.B.3
Law, V.J.4
Kong, M.G.5
-
21
-
-
77956307082
-
-
L. W. Chen, P. Zhao, X. S. Shu, J. Shen, and Y. D. Meng: Phys. Plasmas 17 (2010) 083502.
-
(2010)
Phys. Plasmas
, vol.17
, pp. 083502
-
-
Chen, L.W.1
Zhao, P.2
Shu, X.S.3
Shen, J.4
Meng, Y.D.5
-
22
-
-
61449164947
-
-
X. Lu, Q. Xiong, Z. Xiong, J. Hu, F. Zhou, W. Gong, Y. Xian, C. Zou, Z. Tang, Z. Jiang, and Y. Pan: J. Appl. Phys. 105 (2009) 043304.
-
(2009)
J. Appl. Phys.
, vol.105
, pp. 043304
-
-
Lu, X.1
Xiong, Q.2
Xiong, Z.3
Hu, J.4
Zhou, F.5
Gong, W.6
Xian, Y.7
Zou, C.8
Tang, Z.9
Jiang, Z.10
Pan, Y.11
-
24
-
-
50249116878
-
-
S. A. Starostin, M. A. M. ElSabbagh, E. Aldea, H. de Vries, M. Creatore, and M. C. M. van de Sanden: IEEE Trans. Plasma Sci. 36 (2008) 968.
-
(2008)
IEEE Trans. Plasma Sci.
, vol.36
, pp. 968
-
-
Starostin, S.A.1
ElSabbagh, M.A.M.2
Aldea, E.3
De Vries, H.4
Creatore, M.5
Van De Sanden, M.C.M.6
-
27
-
-
48349090992
-
-
J. Grava, M. A. Purvis, J. Filevich, M. C. Marconi, J. J. Rocca, J. Dunn, S. J. Moon, and V. N. Shlyaptsev: Phys. Rev. E 78 (2008) 016403.
-
(2008)
Phys. Rev.
, vol.E 78
, pp. 016403
-
-
Grava, J.1
Purvis, M.A.2
Filevich, J.3
Marconi, M.C.4
Rocca, J.J.5
Dunn, J.6
Moon, S.J.7
Shlyaptsev, V.N.8
-
28
-
-
47649099842
-
-
P. Belo, W. Fundamenski, V. Parail, G. Corrigan, C. Giroud, J. Spence, and JET EFDA contributors: Plasma Phys. Control. Fusion 50 (2008) 085003.
-
(2008)
JET EFDA contributors: Plasma Phys. Control. Fusion
, vol.50
, pp. 085003
-
-
Belo, P.1
Fundamenski, W.2
Parail, V.3
Corrigan, G.4
Giroud, C.5
Spence, J.6
-
36
-
-
1642338448
-
-
D. Bernardi, V. Colombo, E. Ghedini, A. Mentrelli, and T. Trombetti: Eur. Phys. J. D 28 (2004) 423.
-
(2004)
Eur. Phys. J.
, vol.D 28
, pp. 423
-
-
Bernardi, D.1
Colombo, V.2
Ghedini, E.3
Mentrelli, A.4
Trombetti, T.5
-
41
-
-
0000214916
-
-
J. M. Meek: Phys. Rev. 57 (1940) 722.
-
(1940)
Phys Rev
, vol.57
, pp. 722
-
-
Meek J, M.1
-
49
-
-
76949090245
-
-
S. Q. Gu, W. J. Chen, J. H. Chen, H. X. He, and G. J. Qian: IEEE Trans. Plasma Sci. 38 (2010) 214.
-
(2010)
IEEE Trans. Plasma Sci.
, vol.38
, pp. 214
-
-
Gu, S.Q.1
Chen, W.J.2
Chen, J.H.3
He, H.X.4
Qian, G.J.5
-
53
-
-
0031558473
-
-
N. Goelian, P. Lalande, A. Bondiou Clergerie, G. L. Bacchiega, A. Gazzani, and I. Gallimberti: J. Phys. D 30 (1997) 2441.
-
(1997)
J. Phys.
, vol.D 30
, pp. 2441
-
-
Goelian, N.1
Lalande, P.2
Bondiou Clergerie, A.3
Bacchiega, G.L.4
Gazzani, A.5
Gallimberti, I.6
-
54
-
-
33846589312
-
-
L. B. Loeb: Science 69 (1929) 509.
-
(1929)
Science
, vol.69
, pp. 509
-
-
Loeb, L.B.1
-
55
-
-
70349911801
-
-
Q. Li, J. T. Li, W. C. Zhu, X. M. Zhu, and Y. K. Pu: Appl. Phys. Lett. 95 (2009) 141502.
-
(2009)
Appl. Phys. Lett.
, vol.95
, pp. 141502
-
-
Li, Q.1
Li, J.T.2
Zhu, W.C.3
Zhu, X.M.4
Pu, Y.K.5
-
56
-
-
3142664048
-
-
H. B. Zhang and D. Zhang ( Science Press, Beijing, [in Chinese
-
H. Sugai: Plasma Electronic Engineering, transl. H. B. Zhang and D. Zhang (Science Press, Beijing, 2002) p. 50 [in Chinese].
-
(2002)
Plasma Electronic Engineering, transl
, pp. 50
-
-
Sugai, H.1
-
57
-
-
0035331697
-
-
S. M. Starikovskaia, N. B. Anikin, S. V. Pancheshnyi, D. V. Zatsepin, and A. Yu. Starikovskii: Plasma Sources Sci. Technol. 10 (2001) 344.
-
(2001)
Plasma Sources Sci. Technol.
, vol.10
, pp. 344
-
-
Starikovskaia, S.M.1
Anikin, N.B.2
Pancheshnyi, S.V.3
Zatsepin, D.V.4
Starikovskii, A.Yu.5
-
58
-
-
80052419160
-
-
K. Takashima, I. V. Adamovich, Z. Xiong, M. J. Kushner, S. Starikovskaia, U. Czarnetzki, and D. Luggenholscher: Phys. Plasmas 18 (2011) 083505.
-
(2011)
Phys. Plasmas
, vol.18
, pp. 083505
-
-
Takashima, K.1
Adamovich, I.V.2
Xiong, Z.3
Kushner, M.J.4
Starikovskaia, S.5
Czarnetzki, U.6
Luggenholscher, D.7
-
59
-
-
38849143111
-
-
J. J. Shi, F. C. Zhong, J. Zhang, D. W. Liu, and M. G. Kong: Phys. Plasmas 15 (2008) 013504.
-
(2008)
Phys. Plasmas
, vol.15
, pp. 013504
-
-
Shi, J.J.1
Zhong, F.C.2
Zhang, J.3
Liu, D.W.4
Kong, M.G.5
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