Modeling of mode transition behavior in argon microhollow cathode discharges

Plasma Processes and Polymers

Volumn 6, Issue 5, 2009, Pages 335-346

  Deconinck, Thomas ^a   Raja, Laxminarayan L ^a  

^a The University of Texas at Austin   (United States)

Author keywords

Cold plasma; Computer modeling; Fluid model; Microplasma

Indexed keywords

COLD PLASMA; COMPUTER MODELING; DISCHARGE CURRENTS; DISCHARGE PROPERTIES; FLAT SURFACES; FLUID MODEL; LOW CURRENTS; MICROHOLLOW CATHODE DISCHARGES; MICROPLASMA; MODE TRANSITIONS; NONEQUILIBRIUM PLASMAS; OPERATING REGIMES; PHYSICAL MECHANISM; RELAXATION OSCILLATION; SECONDARY ELECTRONS; SELF-PULSING;

ARGON; COMPUTER SIMULATION; PLASMA DEVICES; PLASMA DISPLAY DEVICES; PLASMA FLOW; PLASMAS;

ELECTRIC DISCHARGES;

EID: 67349196926     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200800144     Document Type: Article

References (25)

1. R. Foest, M. Schmidt, K. Becker, Int. J. Mass Spectrom. 2006, 248, 87.
2. K. H. Schoenbach, A. El-Habachi, W. Shi, M. Ciocca, Plasma Sources Sci. Technol. 1997, 6, 468.
3. A. D. Koutsospyros, S.-M. Yin, C. Christodoulatos, K. Becker, IEEE Trans. Plasma Sci. 2005, 33, 42.
4. M. Miclea, K. Kunze, U. Heitmann, S. Florek, J. Franzke, K. Niemax, J. Phys. D: Appl. Phys. 2005, 38, 1709.
5. P. S. Kothnur, L. L. Raja, Contrib. Plasma Phys. 2007, 47, 9.
6. T. Deconinck, S. Mahadevan, L. L. Raja, IEEE Trans. Plasma Sci. 2008, 36, 1200.
7. K. H. Schoenbach, R. Verhappen, T. Tessnow, F. E. Peterkin, W. W. Byszewski, Appl. Phys. Lett. 1996, 68, 13.
8. D. D. Hsu, D. B. Graves, J. Phys. D: Appl. Phys. 2003, 36, 2898.
9. X. Aubert, G. Bauville, J. Guillon, B. Lacour, V. Puech, A. Rousseau, Plasma Sources Sci. Technol. 2007, 16, 23.
10. B. N. Sismanoglu, J. Amorim, Eur. Phys. J. Appl. Phys. 2008, 41, 165.
11. J. P. Boeuf, L. C. Pitchford, K. H. Schoenbach, Appl. Phys. Lett. 2005, 86, 071501.
12. Z. Lj. Petrovic, A. V. Phelps, Phys. Rev. E 1993, 47, 2806.
13. M. J. Kushner, J. Phys. D: Appl. Phys. 2005, 38, 1633.
14. T. Farouk, B. Farouk, D. Staack, A. Gutsol, A. Fridman, Plasma Sources Sci. Technol. 2006, 15, 676.
15. P. S. Kothnur, L. L. Raja, J. Appl. Phys. 2005, 97, 043305.
16. C. Penache, M. Miclea, A. Brauning-Demian, O. Hohn, S. Schossler, T. Janhke, K. Niemax, H. Schmidt-Bocking, Plasma Sources Sci. Technol. 2002, 11, 476.
17. G. J. M. Hagelaar, L. C. Pitchford, Plasma Sources Sci. Technol. 2005, 14, 722.
18. H. W. Ellis, R. Y. Pai, E. W. McDaniel, E. A. Mason, L. A. Vielhand, At. Data Nucl. Data Table 1976, 17, 177.
19. R. Kee, G. Dixon-Lewis, J. Warnatz, M. Coltrin, J. Miller, Tech. Rep. SAND86-8246 1986.
20. A. V. Phelps, Z. Lj. Petrovic, Plasma Sources Sci. Technol. 1999, 8, R21.
21. Z. Donko, Phys. Rev. E 2001, 64, 026401.
22. D. L. Scharfetter, H. K. Gummel, IEEE Trans. Electron Devices 1969, ED-16, 64.
23. T. Deconinck, S. Mahadevan, L. L. Raja, J. Comp. Phys., under review.
24. C. Lazzaroni, A. Rousseau, O. Guaitella, 61st Gaseous Electronics Conference, American Physical Society, Dallas, 2008.
25. B. Lay, R. S. Moss, S. Rauf, M. J. Kushner, Plasma Sources Sci. Technol. 2003, 12, 8.