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Volumn 45, Issue 48, 2012, Pages
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Model of a low-pressure radio-frequency inductive discharge in Ar/O 2 used for plasma spray deposition
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Author keywords
[No Author keywords available]
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Indexed keywords
BASIC PARAMETERS;
DEPOSITION PROCESS;
DISCHARGE PARAMETERS;
FLUX RATIO;
GAS PRESSURES;
GLOBAL MODELS;
INDUCTIVE DISCHARGES;
NANO-STRUCTURED;
NUMERICAL INTEGRATIONS;
PARAMETRIC STUDY;
PARTICLE BALANCE;
PLASMA REACTORS;
PLASMA SPRAY DEPOSITION;
POWER BALANCE EQUATIONS;
PULSED PLASMA;
RADIO FREQUENCIES;
REACTIVE SPECIES;
RF-POWER;
SPECIES DENSITY;
STEADY STATE;
SUBSTRATE HOLDERS;
ZINC OXIDE THIN FILMS;
ARGON;
NUMERICAL METHODS;
PLASMA APPLICATIONS;
PLASMA SPRAYING;
ZINC OXIDE;
ELECTRIC DISCHARGES;
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EID: 84869070339
PISSN: 00223727
EISSN: 13616463
Source Type: Journal
DOI: 10.1088/0022-3727/45/48/485207 Document Type: Article |
Times cited : (7)
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References (13)
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