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Volumn 45, Issue 48, 2012, Pages

Model of a low-pressure radio-frequency inductive discharge in Ar/O 2 used for plasma spray deposition

Author keywords

[No Author keywords available]

Indexed keywords

BASIC PARAMETERS; DEPOSITION PROCESS; DISCHARGE PARAMETERS; FLUX RATIO; GAS PRESSURES; GLOBAL MODELS; INDUCTIVE DISCHARGES; NANO-STRUCTURED; NUMERICAL INTEGRATIONS; PARAMETRIC STUDY; PARTICLE BALANCE; PLASMA REACTORS; PLASMA SPRAY DEPOSITION; POWER BALANCE EQUATIONS; PULSED PLASMA; RADIO FREQUENCIES; REACTIVE SPECIES; RF-POWER; SPECIES DENSITY; STEADY STATE; SUBSTRATE HOLDERS; ZINC OXIDE THIN FILMS;

EID: 84869070339     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/45/48/485207     Document Type: Article
Times cited : (7)

References (13)
  • 10
    • 0000069427 scopus 로고    scopus 로고
    • 2 and CO as a function of temperature from 300 to 1400 K: Derivation of rotational and vibrational energy effects
    • DOI 10.1063/1.477142, PII S0021960698005376
    • Midey A J and Viggiano A A 1998 J. Chem. Phys. 109 5257 (Pubitemid 128678696)
    • (1998) Journal of Chemical Physics , vol.109 , Issue.13 , pp. 5257-5263
    • Midey, A.J.1    Viggiano, A.A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.