Model of a low-pressure radio-frequency inductive discharge in Ar/O 2 used for plasma spray deposition

Journal of Physics D: Applied Physics

Volumn 45, Issue 48, 2012, Pages

  Lazzaroni, C ^a   Baba, K ^a   Nikravech, M ^a   Chabert, P ^b  

^a UNIVERSITÉ PARIS 13   (France)

^b ECOLE POLYTECHNIQUE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

BASIC PARAMETERS; DEPOSITION PROCESS; DISCHARGE PARAMETERS; FLUX RATIO; GAS PRESSURES; GLOBAL MODELS; INDUCTIVE DISCHARGES; NANO-STRUCTURED; NUMERICAL INTEGRATIONS; PARAMETRIC STUDY; PARTICLE BALANCE; PLASMA REACTORS; PLASMA SPRAY DEPOSITION; POWER BALANCE EQUATIONS; PULSED PLASMA; RADIO FREQUENCIES; REACTIVE SPECIES; RF-POWER; SPECIES DENSITY; STEADY STATE; SUBSTRATE HOLDERS; ZINC OXIDE THIN FILMS;

ARGON; NUMERICAL METHODS; PLASMA APPLICATIONS; PLASMA SPRAYING; ZINC OXIDE;

ELECTRIC DISCHARGES;

EID: 84869070339     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/45/48/485207     Document Type: Article

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