Optical characterization of TiAlN/TiAlON/SiO 2 absorber for solar selective applications

Surface and Coatings Technology

Volumn 211, Issue , 2012, Pages 41-44

  Rebouta, L ^a   Pitaes A ^a   Andritschky, M ^a   Capela, P ^a   Cerqueira, M F ^a   Matilainen, A ^b   Pischow, K ^b  

^a UNIVERSITY OF MINHO   (Portugal)

^b Savo Solar Oy   (Finland)

Author keywords

PECVD; Reactive magnetron sputtering; Solar selective absorber; TiAlN; TiAlNO

Indexed keywords

ABSORBER TEMPERATURES; ABSORPTANCE; DIELECTRIC FUNCTIONS; FT-IR-SPECTROMETERS; INTEGRATING SPHERES; MEASURING DATA; OPTICAL CHARACTERIZATION; PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION; REACTIVE MAGNETRON SPUTTERING; SOLAR ABSORPTANCE; SOLAR SELECTIVE ABSORBER; SPECTRAL TRANSMITTANCE; TANDEM ABSORBER; THERMAL EMITTANCE; THERMAL-ANNEALING; THREE-LAYER; TIALN; TIALNO;

FOURIER TRANSFORM INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; OPTICAL CONSTANTS; OPTICAL PROPERTIES; OPTIMIZATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

SOLAR ABSORBERS;

EID: 84868658831     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.09.003     Document Type: Article

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