Stress induced birefringence tuning in femtosecond laser fabricated waveguides in fused silica

Optics Express

Volumn 20, Issue 22, 2012, Pages 24103-24114

  Fernandes, Luís A ^a,b   Grenier, Jason R ^a   Herman, Peter R ^a   Stewart Aitchison, J ^a   Marques, Paulo V S ^b  

^a UNIVERSITY OF TORONTO   (Canada)

^b UNIVERSITY OF PORTO   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFERENT GEOMETRY; FEMTOSECOND LASER EXPOSURE; FORM BIREFRINGENCE; GRATING WAVEGUIDES; LASER MODIFICATIONS; LASER POLARIZATION; MATERIAL STRESS; NANOGRATING; POLARIZATION INDEPENDENT; POLARIZATION SPLITTINGS; PULSE ENERGIES; STRESS BIREFRINGENCE; STRESS INDUCED BIREFRINGENCE; STRESSING BARS; WAVEGUIDE BIREFRINGENCE;

POLARIZATION; ULTRASHORT PULSES; WAVEGUIDES;

BIREFRINGENCE;

EID: 84868229988     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.20.024103     Document Type: Article

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