Hybrid laser and reactive ion etching of Parylene-C for deinsulation of a Utah electrode array

Journal of Micromechanics and Microengineering

Volumn 22, Issue 10, 2012, Pages

  Yoo, Je Min ^a,b   Song, Jong In ^a   Tathireddy, Prashant ^b   Solzbacher, Florian ^b   Rieth, Loren W ^b  

^a Gwangju Institute of Science and Technology (GIST)   (South Korea)

^b University of Utah   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTION POTENTIALS; ACTIVE AREA; COMPLEX 3D GEOMETRY; COMPLEX GEOMETRIES; ELECTRODE ARRAYS; ELECTRODE IMPEDANCE; ELECTRODE SURFACES; ELECTRODE TIP; HYBRID LASERS; LASER ABLATION TECHNIQUE; NEURAL INTERFACES; NEURAL SIGNALS; NONUNIFORMITY; PARYLENE C; REACTIVE ION; REDEPOSITION;

ABLATION; BIOLOGICAL MATERIALS; DEBRIS; ELECTRODES; ELECTROPHYSIOLOGY; INTERFACES (MATERIALS); PHOTOELECTRONS; PLASMA ETCHING; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

LASERS;

EID: 84867947730     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/22/10/105036     Document Type: Article

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