Plasmonic modulator optimized by patterning of active layer and tuning permittivity

Optics Communications

Volumn 285, Issue 24, 2012, Pages 5500-5507

  Babicheva, Viktoriia E ^a,b   Lavrinenko, Andrei V ^a  

^a TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

^b MOSCOW INSTITUTE OF PHYSICS AND TECHNOLOGY   (Russian Federation)

Author keywords

Electro optical devices; Integrated circuits; Modulators; Plasmonic waveguides; Surface plasmons; Waveguide Bragg gratings

Indexed keywords

ACTIVE LAYER; ACTIVE MATERIAL; EIGEN MODES; ELECTRICAL CONTROL; EXTERNAL FIELDS; FILLING FACTOR; INDIUM TIN OXIDE; METAL INSULATOR METALS; METAL PLATES; MULTILAYER CORE; ONE-DIMENSION; OPTIMUM PARAMETERS; PATTERN SIZE; PATTERNED ITO; PHOTONIC INTEGRATED CIRCUITS; PLASMON RESONANCES; PLASMONIC; PLASMONIC WAVEGUIDES; SURFACE PLASMONS; ULTRA-THIN; ULTRATHIN LAYERS; WAVEGUIDE BRAGG GRATING; WAVEGUIDE STRUCTURE;

BRAGG GRATINGS; ELECTROOPTICAL DEVICES; INTEGRATED CIRCUITS; MIM DEVICES; NANOPHOTONICS; OPTICAL WAVEGUIDES; OPTIMIZATION; PERMITTIVITY; PLASMONS; TIN; TIN OXIDES; WAVEGUIDES;

MODULATORS;

EID: 84867574871     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optcom.2012.07.117     Document Type: Article

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