Giant flexoelectric effect through interfacial strain relaxation

Philosophical Transactions of the Royal Society A: Mathematical, Physical and Engineering Sciences

Volumn 370, Issue 1977, 2012, Pages 4944-4957

  Lee, Daesu ^a   Noh, Tae Won ^a  

^a Seoul National University   (South Korea)

Author keywords

Epitaxial thin film; Ferroelectric; Flexoelectric effect; Strain gradient

Indexed keywords

CHEMICAL INDUSTRY; ELECTRIC FIELDS; FERROELECTRIC MATERIALS; FERROELECTRICITY; THIN FILMS;

BULK SOLIDS; EPITAXIAL THIN FILMS; EXPERIMENTAL OBSERVATION; FERROELECTRIC PROPERTY; FLEXOELECTRIC EFFECTS; FLEXOELECTRICITY; INTERFACIAL STRAIN; ORDERS OF MAGNITUDE; POTENTIAL APPLICATIONS; STRAIN GRADIENTS;

EPITAXIAL GROWTH;

EID: 84866862988     PISSN: 1364503X     EISSN: None     Source Type: Journal    
DOI: 10.1098/rsta.2012.0200     Document Type: Review

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