Oxygen vacancy induced re-entrant spin glass behavior in multiferroic ErMnO3 thin films

Applied Physics Letters

Volumn 93, Issue 16, 2008, Pages

  Jang, S Y ^a   Lee, D ^a   Lee, J H ^a   Noh, T W ^a   Jo, Y ^b   Jung, M H ^b   Chung, J S ^c  

^a Seoul National University   (South Korea)

^b Korea Basic Science Institute (KBSI)   (South Korea)

^c Soongsil University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIFERROMAGNETIC MATERIALS; ANTIFERROMAGNETISM; EPITAXIAL FILMS; FERROELECTRIC FILMS; FERROMAGNETISM; FLOW INTERACTIONS; GLASS; MAGNETIC MATERIALS; MAGNETIC THIN FILMS; MANGANESE; MANGANESE COMPOUNDS; OXYGEN; OZONE WATER TREATMENT; PLATINUM; SPIN DYNAMICS; SPIN GLASS; THICK FILMS; THIN FILMS; VACANCIES; YTTRIA STABILIZED ZIRCONIA; ZIRCONIA;

ANTIFERROMAGNETIC INTERACTIONS; EPITAXIAL THIN FILMS; EXCESS ELECTRONS; FERROMAGNETIC INTERACTIONS; HEXAGONAL; HEXAGONAL GEOMETRIES; LOW TEMPERATURES; MAGNETIC; MULTIFERROIC; OXYGEN PARTIAL PRESSURES; PT(111); STABILIZED ZIRCONIAS;

OXYGEN VACANCIES;

EID: 54949142143     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3006325     Document Type: Article

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