Substrate hardness dependency on properties of Al 2O 3 thick films grown by aerosol deposition

Surface and Coatings Technology

Volumn 209, Issue , 2012, Pages 160-168

  Lee, Dong Won ^a,b   Kim, Hyung Jun ^a   Kim, Yong Nam ^b   Jeon, Min Seok ^b   Nam, Song Min ^a  

^a Kwangwoon University   (South Korea)

^b Korea Testing Laboratory   (South Korea)

Author keywords

Aerosol deposition; Al 2O 3; Deposition rate; Hardness; Sapphire

Indexed keywords

ADHESIVE PROPERTIES; AEROSOL DEPOSITION; CU SUBSTRATE; DEPOSITION RATE; HARD SUBSTRATE; HARDNESS; IMPACT VELOCITIES; INITIAL STAGES; PROPERTIES OF AL; ROOM TEMPERATURE; SAPPHIRE; SAPPHIRE SUBSTRATES; SUBSTRATE HARDNESS; THICKNESS OF FILMS;

EID: 84866855828     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2012.08.012     Document Type: Article

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