Subsurface analysis of semiconductor structures with helium ion microscopy

Microelectronics Reliability

Volumn 52, Issue 9-10, 2012, Pages 2104-2109

  Van Gastel, Raoul ^a   Hlawacek, Gregor ^a   Zandvliet, Harold J W ^a   Poelsema, Bene ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

AMOUNT OF INFORMATION; BACK-SCATTERED; CROSS SECTION; DIRECT IMAGING; ELECTRICAL CHARACTERIZATION; ELECTRICAL CONTACTS; HELIUM ION; IN-SITU; LATERAL SPREADING; OXIDE LAYER; PLANAR INTERSECTION; PREPARATION PROCEDURES; SEMICONDUCTOR STRUCTURE;

HELIUM;

ION MICROSCOPES;

EID: 84866742104     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.microrel.2012.06.130     Document Type: Article

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