Low temperature growth of nanocrystalline and ultrananocrystalline diamond films: A comparison

Physica Status Solidi (A) Applications and Materials Science

Volumn 209, Issue 9, 2012, Pages 1664-1674

  Kulisch, Wilhelm ^a   Petkov, Christo ^a   Petkov, Emil ^a   Popov, Cyril ^a   Gibson, P Neil ^b   Veres, Miklos ^c   Merz, Rolf ^d   Merz, Birgit ^d   Reithmaier, Johann Peter ^a  

^a UNIVERSITY OF KASSEL   (Germany)

^b JOINT RESEARCH CENTRE   (Italy)

^c INSTITUTE OF EXPERIMENTAL MEDICINE   (Hungary)

^d University of Koblenz Landau   (Germany)

Author keywords

chemical vapor deposition; diamond; nanocrystalline materials

Indexed keywords

BONDING ENVIRONMENT; BONDING STRUCTURE; CHEMICAL VAPOUR DEPOSITION; CRYSTALLINE PROPERTIES; DEPOSITION TEMPERATURES; HOT-FILAMENT CHEMICAL VAPOR DEPOSITION; LOW TEMPERATURE GROWTH; LOW-TEMPERATURE DEPOSITION; MICROWAVE PLASMA; NANOCRYSTALLINES; NCD FILMS; TEMPERATURE RANGE; ULTRANANOCRYSTALLINE DIAMOND FILMS; ULTRANANOCRYSTALLINE DIAMONDS;

CHEMICAL VAPOR DEPOSITION; DIAMONDS; GRAIN BOUNDARIES; MORPHOLOGY; NANOCRYSTALLINE MATERIALS; PHOTOELECTRONS; PLASMA CVD; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; TEMPERATURE; VAPORS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

DIAMOND FILMS;

EID: 84866414198     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.201228270     Document Type: Article

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