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Volumn 112, Issue 5, 2012, Pages

Size effects in vapor-solid-solid Ge nanowire growth with a Ni-based catalyst

Author keywords

[No Author keywords available]

Indexed keywords

BINARY SYSTEMS; EPITAXIAL INTERFACES; HIGH DENSITY; LOW ENERGIES; LOW TEMPERATURES; NANOWIRE GROWTH; NI-BASED CATALYST; SIZE EFFECTS; SLOW GROWTH; SOLID-SOLID;

EID: 84866390854     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4749797     Document Type: Conference Paper
Times cited : (22)

References (36)
  • 11
    • 0000338325 scopus 로고    scopus 로고
    • (1966). 10.1016/0038-1101(66)90085-2
    • W. Bullis, Solid-State Electron. 9, 143-168 (1966). 10.1016/0038-1101(66) 90085-2
    • Solid-State Electron. , vol.9 , pp. 143-168
    • Bullis, W.1
  • 36
    • 84866380658 scopus 로고    scopus 로고
    • See supplementary material at E-JAPIAU-112-006218 for SEM image of as-deposited Ni catalyst on Ge substrate, Ni-Ge binary phase diagram and x-ray diffraction results from annealed Ni thin film on Ge substrate
    • See supplementary material at http://dx.doi.org/10.1063/1.4749797 E-JAPIAU-112-006218 for SEM image of as-deposited Ni catalyst on Ge substrate, Ni-Ge binary phase diagram and x-ray diffraction results from annealed Ni thin film on Ge substrate.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.