Improving mobility of F-doped SnO 2 Thin Films by introducing temperature gradient during low-pressure chemical vapor deposition

Japanese Journal of Applied Physics

Volumn 51, Issue 9, 2012, Pages

  Isshiki, Masanobu ^a,b   Ikeda, Toru ^a   Okubo, Junichi ^a   Oyama, Takuji ^a   Shidoji, Eiji ^a   Odaka, Hidefumi ^a   Sichanugrist, Porponth ^b   Konagai, Makoto ^b  

^a ASAHI GLASS CO LTD   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FREE CARRIER ABSORPTION; HIGH MOBILITY; NEAR INFRARED REGION; OPTIMUM DEPOSITION;

CHEMICAL VAPOR DEPOSITION; INFRARED DEVICES; THERMAL GRADIENTS; VAPORS;

CARRIER MOBILITY;

EID: 84865857134     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.51.095801     Document Type: Article

References (31)

1. J. Krc, B. Lipovsek, M. Bokalic, A. Campa, T. Oyama, M. Kambe, T. Matsui, H. Sai, M. Kondo, and M. Topic: Thin Solid Films 518 (2010) 3054.
2. M. Konagai: Jpn. J. Appl. Phys. 50 (2011) 030001.
3. P. Drude: Z. Phys. 1 (1900) 161 [in German].
4. Y. Kanai: Jpn. J. Appl. Phys. 23 (1984) 127.
5. Y. Kanai: Jpn. J. Appl. Phys. 23 (1984) L12.
6. Y. Meng, X. Yang, H. Chen, J. Shen, Y. Jiang, Z. Zhang, and Z. Hua: Thin Solid Films 394 (2001) 218.
7. Y. Yoshida, D. M. Wood, T. A. Gessert, and T. J. Coutts: Appl. Phys. Lett. 84 (2004) 2097.
8. C. Warmsingh, Y. Yoshida, D. W. Readey, C. W. Teplin, J. D. Perkins, P. A. Parilla, L. M. Gedvilas, B. M. Keyes, and D. S. Ginley: J. Appl. Phys. 95 (2004) 3831.
9. A. E. Delahoy and S. Y. Guo: J. Vac. Sci. Technol. A 23 (2005) 1215.
10. M. F. A. M. van Hest, M. S. Dabney, J. D. Perkins, D. S. Ginley, and M. P. Taylor: Appl. Phys. Lett. 87 (2005) 032111.
11. P. F. Newhouse, C.-H. Park, D. A. Keszler, J. Tate, and P. S. Nyholm: Appl. Phys. Lett. 87 (2005) 112108.
12. T. Koida and M. Kondo: Appl. Phys. Lett. 89 (2006) 082104.
13. T. Koida and M. Kondo: J. Appl. Phys. 101 (2007) 063705.
14. T. Koida and M. Kondo: J. Appl. Phys. 101 (2007) 063713.
15. T. Koida, M. Kondo, K. Tsutsumi, A. Sakaguchi, M. Suzuki, and H. Fujiwara: J. Appl. Phys. 107 (2010) 033514.
16. M. A. Marti'nez, M. T. Gutiérrez, and C. Maffiotte: Surf. Coatings Technol. 110 (1998) 68.
17. M. Kambe, N. Taneda, A. Takahashi, and T. Oyama: Res. Rep. Asahi Glass Co., Ltd. 60 (2010) 7 [in Japanese].
18. S. Nakao, N. Yamada, T. Hitosugi, Y. Hirose, T. Shimada, and T. Hasegawa: Appl. Phys. Express 3 (2010) 031102.
19. S. Nakao, N. Yamada, T. Hitosugi, Y. Hirose, T. Shimada, and T. Hasegawa: Phys. Status Solidi C 8 (2011) 543.
20. J. A. Greer and M. D. Tabat: J. Vac. Sci. Technol. A 13 (1995) 1175.
21. M. Mizuhashi, Y. Gotoh, and K. Adachi: Jpn. J. Appl. Phys. 27 (1988) 2053.
22. M. Kambe, K. Sato, D. Kobayashi, Y. Kurokawa, S. Miyajima, M. Fukawa, N. Taneda, A. Yamada, and M. Konagai: Jpn. J. Appl. Phys. 45 (2006) L291.
23. K. Sato, Y. Gotoh, Y. Wakayama, Y. Hayashi, K. Adachi, and H. Nishimura: Rep. Res. Lab. Asahi Glass Co. Ltd. 42 (1992) 129.
24. J. van Deelen, T. van Mol, P. Poodt, F. Grob, and K. Spee: Proc. 34th IEEE Photovoltaic Specialists Conf., 2009, 000271.
25. X. Li, T. Gessert, C. DeHart, T. Barnes, H. Moutinho, Y. Yan, D. Young, M. Young, J. Perkins, and T. Coutts: NREL Conf. Prepr. NREL/CP-520-31017.
26. T. A. Gessert, J. Burst, X. Li, M. Scott, and T. J. Coutts: Thin Solid Films 519 (2011) 7146.
27. C. F. Wan, R. D. McGrath, W. F. Keenan, and S. N. Frank: J. Electrochem. Soc. 136 (1989) 1459.
28. A. L. Patterson: Phys. Rev. 56 (1939) 978.
29. R. L. Petritz: Phys. Rev. 110 (1958) 1254.
30. 166th Committee on Photonic and Electronic Oxide: Tomei Dodenmaku no Gijutsu (Technology of Transparent Conductive Oxide Thin-Films) (Ohmsha, Tokyo, 2006) 2nd ed., p. 51 [in Japanese].
31. T. Ikeda, K. Sato, Y. Hayashi, Y. Wakayama, K. Adachi, and H. Nishimura: Tech. Dig. 7th Photovoltaic Science and Engineering Conf., 1993, p. 17.