Ellipsometry characterization of a-Si:H layers for thin-film solar cells

Journal of Non-Crystalline Solids

Volumn 358, Issue 17, 2012, Pages 2257-2259

  Kageyama, Shota ^a   Akagawa, Masataka ^a   Fujiwara, Hiroyuki ^a  

^a GIFU UNIVERSITY   (Japan)

Author keywords

a Si:H; Dielectric function; Microstructure; Solar cell; Spectroscopic ellipsometry

Indexed keywords

A-SI:H; BOND DENSITIES; DIELECTRIC FUNCTIONS; GLASS SUBSTRATES; HYDROGENATED AMORPHOUS SILICON (A-SI:H); INFRARED ELLIPSOMETRY; LOCAL STRUCTURE; MICRO VOIDS; MICROSCOPIC STRUCTURES; THIN-FILM SOLAR CELLS;

CHARACTERIZATION; MICROSTRUCTURE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SOLAR CELLS; SPECTROSCOPIC ELLIPSOMETRY; SUBSTRATES;

SILICON;

EID: 84865783166     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2011.12.042     Document Type: Conference Paper

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