Excitation Frequency Effects on Stabilized Efficiency of Large-Area Amorphous Silicon Solar Cells Using Flexible Plastic Film Substrate

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 42, Issue 11 A, 2003, Pages

  Takano, Akihiro ^a   Tanda, Masayuki ^a   Shimosawa, Makoto ^a   Wada, Takehito ^a   Kamoshita, Tomoyoshi ^a  

^a FUJI ELECTRIC CO   (Japan)

Author keywords

Excitation frequency; Flexible film substrate; Hydrogenated amorphous silicon; Large area; Plasma chemical vapor deposition; Solar cell

Indexed keywords

AMORPHOUS SILICON; CURRENT VOLTAGE CHARACTERISTICS; DEPOSITION; ELECTRIC POTENTIAL; ELECTRODES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; PLASTIC FILMS; SUBSTRATES;

FLEXIBLE FILM SUBSTRATE; ION ENERGY; PLASMA EXCITATION FREQUENCY;

SOLAR CELLS;

EID: 0346276863     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.l1312     Document Type: Article

References (6)

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